Difference between revisions of "Template:Announcements"
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<!------------- Announcements ----------------> |
<!------------- Announcements ----------------> |
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− | ===== |
+ | ===== ASML Stepper 3: Wafer stuck ===== |
+ | There is a wafer stuck on the D-Chuck. Will email when it's been removed. |
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− | The Nanofab is open following wildfire-induced power outages. The tools below are still down and we are working to get them running. We'll send out an email for each tool below when it is ready to run. |
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− | * Ebeam #4 is in regen |
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− | * IBD |
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− | The Holiday Fire is expected to be at full containment by July 11th. |
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===== PlasmaTherm SLR: Down ===== |
===== PlasmaTherm SLR: Down ===== |
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− | The SLR fluorine etcher is down, the turbo has failed |
+ | The SLR fluorine etcher is down, the turbo has failed. |
// [[User:John d|John d]] 22:04, 6 July 2018 (PDT) |
// [[User:John d|John d]] 22:04, 6 July 2018 (PDT) |
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Revision as of 19:02, 14 July 2018
UCSB NanoFab Announcements
ASML Stepper 3: Wafer stuck
There is a wafer stuck on the D-Chuck. Will email when it's been removed. // John d 19:02, 14 July 2018 (PDT)
PlasmaTherm SLR: Down
The SLR fluorine etcher is down, the turbo has failed. // John d 22:04, 6 July 2018 (PDT)
PECVD#1: Software Upgrade
We are going to upgrade the computer and software on PECVD#1 in 2–3 weeks. The tool will be down for three to five days. Once the upgrade is complete, everyone will need to be retrained on the new software. You should start planning accordingly, if you use this tool. We will send out an email when we know the exact dates. // John d 15:05, 20 June 2018 (PDT)
RIE#5: SiCl4 Issue
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)