Difference between revisions of "Template:Announcements"

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(Lab closed, deleted non-urgent announcements)
(Lab open)
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<!------------- Announcements ---------------->
 
<!------------- Announcements ---------------->
   
===== LAB CLOSED =====
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===== LAB OPEN =====
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The Nanofab is open. The tools below are still down and we are working to get them running. I'll send out an email for each tool below when it is ready to run.
Due to the fire in the hills above Goleta and brownouts from it, we are closing the nanofab for the night. We will be in tomorrow morning to evaluate the safety of restarting all the tools. Please check email for updates.
 
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// [[User:John d|John d]] 22:26, 6 July 2018 (PDT)
 
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Ebeam #4 is in regen
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IBD
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Unaxis VLR
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Be aware that the Holiday Fire could cause further power outages, especially at night.
 
// [[User:John d|John d]] 10:14, 7 July 2018 (PDT)
   
 
===== PlasmaTherm SLR: Down =====
 
===== PlasmaTherm SLR: Down =====

Revision as of 10:14, 7 July 2018

UCSB NanoFab Announcements

LAB OPEN
The Nanofab is open. The tools below are still down and we are working to get them running. I'll send out an email for each tool below when it is ready to run. 

Ebeam #4 is in regen IBD Unaxis VLR

Be aware that the Holiday Fire could cause further power outages, especially at night. // John d 10:14, 7 July 2018 (PDT)

PlasmaTherm SLR: Down

The SLR fluorine etcher is down, the turbo has failed. Will work on it on Monday. // John d 22:04, 6 July 2018 (PDT)

PECVD#1: Software Upgrade

We are going to upgrade the computer and software on PECVD#1 in 2–3 weeks. The tool will be down for three to five days. Once the upgrade is complete, everyone will need to be retrained on the new software. You should start planning accordingly, if you use this tool. We will send out an email when we know the exact dates. // John d 15:05, 20 June 2018 (PDT)

RIE#5: SiCl4 Issue

We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)