Difference between revisions of "Template:Announcements"
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<!------------- Announcements ----------------> |
<!------------- Announcements ----------------> |
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| − | ===== ICP#2: |
+ | ===== ICP#2: up ===== |
| + | Tool was checked and is up for use. |
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| − | There is a problem with backside He pressure. The system is down until it is corrected. I will send an email once the problem is corrected. |
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| − | // [[User:John d|John d]] |
+ | // [[User:John d|John d]] 08:46, 26 June 2018 (PDT) |
===== PECVD#1: Software Upgrade ===== |
===== PECVD#1: Software Upgrade ===== |
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Revision as of 08:46, 26 June 2018
UCSB NanoFab Announcements
ICP#2: up
Tool was checked and is up for use. // John d 08:46, 26 June 2018 (PDT)
PECVD#1: Software Upgrade
We are going to upgrade the computer and software on PECVD#1 in 2–3 weeks. The tool will be down for three to five days. Once the upgrade is complete, everyone will need to be retrained on the new software. You should start planning accordingly, if you use this tool. We will send out an email when we know the exact dates. // John d 15:05, 20 June 2018 (PDT)
AFM: Up
AFM head has been returned from service, system is up for use. Please notify NanoFab@ece.ucsb.edu if you experience any problems with it. // John d 17:24, 15 June 2018 (PDT)
RIE#5: SiCl4 Issue
We have a flow rate problem on the SiCl4 gas line. You can only flow the SiCl4 for 5 minutes and then you have to wait 5 minutes before you flow it again. So in order to to do a 10 minute Etch you will have to do it in three steps flow 5 mi, wait 5mi, then flow 5min. // John d 17:22, 15 June 2018 (PDT)
Solvent Bench Bay 7 - Heated Bath
We have disabled the auto refill due to a high water level. Please use the manual fill and a manual drain button at the center top of the head case. Users of the bath might need to fill or drain as you insert/remove your beakers. Please be careful with other user's beakers. // John d 17:18, 6 June 2018 (PDT)