Difference between revisions of "Template:Announcements"

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(lab reopened update, deleted DSE wafer removed)
(rie5 SiCl4 UP, deleted "lab open")
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<!------------- Announcements ---------------->
 
<!------------- Announcements ---------------->
   
===== Lab Re-Opened =====
+
===== RIE#5: SiCl4 Up =====
  +
SiCl4 gas is available again on RIE #5.The maximum flow rate is 10 sccm.
Maintenance is complete.
 
// [[User:John d|John d]] 16:14, 11 June 2018 (PDT)
+
// [[User:John d|John d]] 16:17, 12 June 2018 (PDT)
   
 
===== AFM Down =====
 
===== AFM Down =====
The laser/laser focus is struggling on the AFM. I will be removing the head and taking it to Bruker for a tune-up/repair this afternoon. The system will be down until some time this week.
+
The laser/laser focus is struggling on the AFM. We have taken the AFM head to Bruker for a tune-up/repair. The system will be down until some time this week.
// [[User:John d|John d]] 11:07, 8 June 2018 (PDT)
+
// [[User:John d|John d]] 16:17, 12 June 2018 (PDT)
   
 
===== Solvent Bench Bay 7 - Heated Bath =====
 
===== Solvent Bench Bay 7 - Heated Bath =====
 
We have disabled the auto refill due to a high water level. Please use the manual fill and a manual drain button at the center top of the head case. Users of the bath might need to fill or drain as you insert/remove your beakers. Please be careful with other user's beakers.
 
We have disabled the auto refill due to a high water level. Please use the manual fill and a manual drain button at the center top of the head case. Users of the bath might need to fill or drain as you insert/remove your beakers. Please be careful with other user's beakers.
 
// [[User:John d|John d]] 17:18, 6 June 2018 (PDT)
 
// [[User:John d|John d]] 17:18, 6 June 2018 (PDT)
 
===== RIE#5: No SiCl4 =====
 
We have received a new bottle of SiCl4 and we are installing a new
 
gas panel. We will notify you when the gas is available.
 
// [[User:John d|John d]] 17:00, 4 June 2018 (PDT)
 
   
 
===== PECVD#2 is Up =====
 
===== PECVD#2 is Up =====

Revision as of 16:17, 12 June 2018

UCSB NanoFab Announcements

RIE#5: SiCl4 Up

SiCl4 gas is available again on RIE #5.The maximum flow rate is 10 sccm. // John d 16:17, 12 June 2018 (PDT)

AFM Down

The laser/laser focus is struggling on the AFM. We have taken the AFM head to Bruker for a tune-up/repair. The system will be down until some time this week. // John d 16:17, 12 June 2018 (PDT)

Solvent Bench Bay 7 - Heated Bath

We have disabled the auto refill due to a high water level. Please use the manual fill and a manual drain button at the center top of the head case. Users of the bath might need to fill or drain as you insert/remove your beakers. Please be careful with other user's beakers. // John d 17:18, 6 June 2018 (PDT)

PECVD#2 is Up

The Plasma Therm Cortex software update is complete, and the system is operational. Standard recipes requalified. Particle counts are now much lower and around historical levels. All users need retraining on the new software. Contact Mike Silva for training. // Thibeault 17:25, 24 May 2018 (PDT)