Difference between revisions of "Template:Announcements"
(rie5 wafers in chamber) |
(RIE#5 SiCl4 update) |
||
Line 17: | Line 17: | ||
===== RIE#5: No SiCl4 ===== |
===== RIE#5: No SiCl4 ===== |
||
− | We |
+ | We have received a new bottle of SiCl4 and we are installing a new |
+ | gas panel. We will notify you when the gas is available. |
||
− | are out of SiCl4. |
||
− | // [[User:John d|John d]] |
+ | // [[User:John d|John d]] 17:00, 4 June 2018 (PDT) |
===== FEI SEM repaired ===== |
===== FEI SEM repaired ===== |
Revision as of 17:00, 4 June 2018
UCSB NanoFab Announcements
RIE#5: wafer stuck in chamber =
It has been reported that two wafers are stuck in the process chamber. Don will address this issue tomorrow morning. // John d 16:59, 4 June 2018 (PDT)
Solvent Bench Bay 7 - Bath & Bench up
The Heated bath in bay 7 is up and ready to use. It is at 80 c now and has a new auto refill as well as a manual fill. Mike Day will be inspecting the bath every morning for water level, contaminated water as well as feed back from all you guys. We know there will most likely be a little fine tuning, So please give Mike Day your feed back. // John d 17:26, 30 May 2018 (PDT)
RIE#5: No SiCl4
We have received a new bottle of SiCl4 and we are installing a new gas panel. We will notify you when the gas is available. // John d 17:00, 4 June 2018 (PDT)
FEI SEM repaired
Door replaced, system up. // John d 17:26, 30 May 2018 (PDT)
PECVD#2 is Up
The Plasma Therm Cortex software update is complete, and the system is operational. Standard recipes requalified. Particle counts are now much lower and around historical levels. All users need retraining on the new software. Contact Mike Silva for training. // Thibeault 17:25, 24 May 2018 (PDT)