Suss MA-6 Backside Alignment QuickStart
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Quick Instructions – for users that are already familiar with the tool – for aligning your mask plate to the back side of a wafer. "BSA" stands for "Back Side Alignment".
- Load mask plate into tool. No sample inserted yet. Empty Sample holder with cutouts for back-side microscope should be fully inserted.
- Enable [BSA MICROSCOPE] soft button, which sets the arrow keys to move the back-side aligning microscope.
- Knobs: Set "Illumination" to "BSA/IR".
- "Top Substrate" is focus on Mask, "BSA Mag" is high/low mag., "BSA/IR" is illumination strength
- Use Arrow Soft Buttons: Drive BS uScope around until can see alignment marks on your mask plate.
- "Top/Bottom" should be enabled to focus on "top" substrate, which is the mask plate.
- Get it in good focus in High mag, then press the [Grab Image] soft button.
- Sample holder should be inserted during Grab, or it will error.
- Mask plate image will be frozen on the computer. You will align to this image using a digital overlay of the live BSA microscope.
- [Load] to insert sample, with sample alignment marks face down. [Enter] to turn on vacuum and/or perform WEC.
- Photoresist should be on the top side, which will be exposed through the mask plate.
- Set up your Contact parameters (contact type, exposure time etc.) beforehand if needed.
- Align using only sample movement micrometer knobs.
- Knobs: "BSA/IR" illumination and "Bottom Substrate" are light & focus, respectivitly.
- [Expose] to shoot your exposure program.
- To expose more wafers, unload exposed wafer, and push empty wafer slide back in. Press [Grab Image] to store image again, and proceed with [Load] command for next wafer.