Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"

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{{tool|{{PAGENAME}}
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{{tool2|{{PAGENAME}}
 
|picture=KLA.jpg
  
|picture=KLA.jpg
 
|type = Inspection, Test and Characterization
  
|type = Inspection, Test and Characterization
 
|super= Biljana Stamenic
  
|super= Biljana Stamenic
  +
|super2= Don Freeborn
 
|location=Bay 5
  
|location=Bay 5
 
|description = Surface Analysis
  
|description = Surface Analysis
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(KLA/Tencor Surfscan)
 +
KLA/Tencor Surfscan
 
|manufacturer = Tencor
  
|manufacturer = Tencor
 
|materials =
  
|materials =
 
|toolid=
 
|toolid=
 
}}
  
}}
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=About=
 +
==About==
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This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.
 +
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.
   
  +
It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.
⚫
=Documentation=
  
  +
⚫
*[[media:Surfscan-Operation-Manual.pdf|Operations Manual]]
  
  +
4-inch wafers are the most standard size to measure.
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*[[media:Surfscan-Surfscan 6200 info.pdf|Surfscan Info]]
  
  +
−
*[[Surfscan6200 photos]]
  
  +
For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use.
  +
  ⚫
==Documentation==
  +
  +
===Operating Procedures===
  +
  +
  +
*[https://wiki.nanofab.ucsb.edu/w/images/a/a2/SURFSCAN_6200_122123_for_8inch_wafers.pdf Surfscan 6200 8inch wafers] *
  +
*[https://wiki.nanofab.ucsb.edu/w/images/1/1a/SURFSCAN_6200_122023_for_6inch_wafers.pdf Surfscan 6200 6inch wafers] *
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*[https://wiki.nanofab.ucsb.edu/w/images/9/9f/SURFSCAN_6200_122123_for_4inch_wafers.pdf Surfscan 6200 4inch wafers] *
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*[https://wiki.nanofab.ucsb.edu/w/images/a/a7/SURFSCAN_6200_122123_small_substrates.pdf Surfscan 6200 [Small samples, and 2inch and 3inch wafers]] *
  +
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**''You must water-mount your small sample or wafer(2inch or 3 inch) to a 4-inch wafer.''
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*[[Wafer scanning process traveler|Wafer Particle Count - Process Traveler]]
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  +
*[https://wiki.nanofab.ucsb.edu/w/images/2/29/Wafer_Particle_Count-Process_Traveler.pdf Wafer Scanning Instructions]
  +
**''This is the procedure Staff uses to calibrate particle counts on our deposition tools.''
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===Other Documentation===
  +
  ⚫
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
  +
**''For detailed measurement info, it is highly recommended that you read the manual.''
  +
  +
*[[Glossary]]
  +
*[[Surfscan Errors and Workarounds|Common Errors & Workarounds]]
  +
  +
==Examples==
  +
{| class="wikitable"
  +
|+A low-particle 4-inch wafer example:
  +
!Gain 4: Small Particles
  +
(0.160µm – 1.60µm)
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!Gain 2: Large Particles
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(1.60µm – 28.0µm)
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|-
  +
|[[File:Surfscan Low-Particle Example - G4.png|frameless|200x200px]]
  +
|[[File:Surfscan Low-Particle Example - G2.png|frameless|200x200px]]
  +
|}
  +
{| class="wikitable"
  +
|+A high-particle 4-inch wafer example:
  +
!Gain 4: Small Particles
  +
(0.160µm – 1.60µm)
  +
!Gain 2: Large Particles
  +
(1.60µm – 28.0µm)
  +
|-
  +
|[[File:Surfscan - 230113A7 Gain4 high particles.jpg|frameless|199x199px]]
  +
|[[File:Surfscan 230113A7G2 after low particles.jpg|frameless|195x195px]]
  +
|}

Latest revision as of 18:02, 2 February 2024

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Location Bay 5
Tool Type Inspection, Test and Characterization
Manufacturer Tencor
Description Surface Analysis 
KLA/Tencor Surfscan
Primary Supervisor Biljana Stamenic
(805) 893-4002
biljana@ece.ucsb.edu

Secondary Supervisor

Don Freeborn

Recipes N/A


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.

It can scan wafers in size from 4 to 8 inches. Piece-parts are more difficult but can be scanned with a custom recipe.

4-inch wafers are the most standard size to measure.

For measuring very low particle counts accurately, purchase "low particle count" (LPC) wafers from a Silicon wafer vendor, and keep the wafers in the case and clean at all times until use.

Documentation

Operating Procedures

Other Documentation

  • Operations Manual
    • For detailed measurement info, it is highly recommended that you read the manual.

Examples

A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan - 230113A7 Gain4 high particles.jpg Surfscan 230113A7G2 after low particles.jpg
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