Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"

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(added exmaple of low particle count)
 
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|picture=KLA.jpg
 
|picture=KLA.jpg
 
|type = Inspection, Test and Characterization
 
|type = Inspection, Test and Characterization
|super= Adam Abrahamsen
+
|super= Biljana Stamenic
 
|location=Bay 5
 
|location=Bay 5
|description = ?
+
|description = Surface Analysis
 +
KLA/Tencor Surfscan
 
|manufacturer = Tencor
 
|manufacturer = Tencor
 
|materials =
 
|materials =
 
|toolid=  
 
|toolid=  
 
}}
 
}}
 +
==About==
 +
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.
  
= About  =
+
==Documentation==
  
 +
*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]
 +
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
 +
**''For detailed measurement info, it is highly recommended that you read the manual.''
 +
*[[Wafer scanning process traveler]]
 +
*[[Glossary]]
 +
*[[Errors]]
  
= Detailed Specifications  =
+
<br />
  
 
+
== Examples ==
= Documentation =
+
<br />
 
+
{| class="wikitable"
*[[media:SurfScan 6200-Operating MAnual.pdf|Operating Instruction Manual]]
+
|+A low-particle 4-inch wafer example:
 +
!Gain 4: Small Particles
 +
(0.160µm – 1.60µm)
 +
!Gain 2: Large Particles
 +
(1.60µm – 28.0µm)
 +
|-
 +
|[[File:Surfscan Low-Particle Example - G4.png|frameless|200x200px]]
 +
|[[File:Surfscan Low-Particle Example - G2.png|frameless|200x200px]]
 +
|}
 +
{| class="wikitable"
 +
|+A high-particle 4-inch wafer example:
 +
!Gain 4: Small Particles
 +
(0.160µm – 1.60µm)
 +
!Gain 2: Large Particles
 +
(1.60µm – 28.0µm)
 +
|-
 +
|''To Be Added''
 +
|''To Be Added''
 +
|}

Latest revision as of 15:09, 18 November 2021

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Tool Type Inspection, Test and Characterization
Location Bay 5
Supervisor Biljana Stamenic
Supervisor Phone (805) 893-4002
Supervisor E-Mail biljana@ece.ucsb.edu
Description Surface Analysis
KLA/Tencor Surfscan 
Manufacturer Tencor


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.

Documentation


Examples


A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

To Be Added To Be Added