Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"
Jump to navigation
Jump to search
(added exmaple of low particle count) |
|||
(7 intermediate revisions by 2 users not shown) | |||
Line 14: | Line 14: | ||
==Documentation== |
==Documentation== |
||
+ | |||
*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]] |
*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]] |
||
− | *[//wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual] |
+ | *[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual] |
**''For detailed measurement info, it is highly recommended that you read the manual.'' |
**''For detailed measurement info, it is highly recommended that you read the manual.'' |
||
*[[Wafer scanning process traveler]] |
*[[Wafer scanning process traveler]] |
||
− | *[[ |
+ | *[[Glossary]] |
+ | *[[Errors]] |
||
+ | |||
+ | <br /> |
||
+ | |||
+ | == Examples == |
||
+ | <br /> |
||
+ | {| class="wikitable" |
||
+ | |+A low-particle 4-inch wafer example: |
||
+ | !Gain 4: Small Particles |
||
+ | (0.160µm – 1.60µm) |
||
+ | !Gain 2: Large Particles |
||
+ | (1.60µm – 28.0µm) |
||
+ | |- |
||
+ | |[[File:Surfscan Low-Particle Example - G4.png|frameless|200x200px]] |
||
+ | |[[File:Surfscan Low-Particle Example - G2.png|frameless|200x200px]] |
||
+ | |} |
||
+ | {| class="wikitable" |
||
+ | |+A high-particle 4-inch wafer example: |
||
+ | !Gain 4: Small Particles |
||
+ | (0.160µm – 1.60µm) |
||
+ | !Gain 2: Large Particles |
||
+ | (1.60µm – 28.0µm) |
||
+ | |- |
||
+ | |''To Be Added'' |
||
+ | |''To Be Added'' |
||
+ | |} |
Revision as of 15:09, 18 November 2021
|
About
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.
Documentation
- Standard Operating Procedure
- Operations Manual
- For detailed measurement info, it is highly recommended that you read the manual.
- Wafer scanning process traveler
- Glossary
- Errors
Examples
Gain 4: Small Particles
(0.160µm – 1.60µm) |
Gain 2: Large Particles
(1.60µm – 28.0µm) |
---|---|
Gain 4: Small Particles
(0.160µm – 1.60µm) |
Gain 2: Large Particles
(1.60µm – 28.0µm) |
---|---|
To Be Added | To Be Added |