Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"

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=About=
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==About==
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This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 6 inches.
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This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.
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  ⚫
==Documentation==
   
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=Documentation=
  
 
*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]
  
*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]
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*[[media:Surfscan-Operation-Manual.pdf|Operations Manual]]
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*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
 
**''For detailed measurement info, it is highly recommended that you read the manual.''
  
**''For detailed measurement info, it is highly recommended that you read the manual.''
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*[[Wafer scanning process traveler]]
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*[[media:Surfscan-Surfscan 6200 info.pdf|Surfscan Info]]
  
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*[[Surfscan6200 photos]]
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*[[Glossary]]
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*[[Errors]]
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<br />
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== Examples ==
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<br />
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{| class="wikitable"
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|+A low-particle 4-inch wafer example:
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!Gain 4: Small Particles
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(0.160µm – 1.60µm)
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!Gain 2: Large Particles
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(1.60µm – 28.0µm)
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|-
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|[[File:Surfscan Low-Particle Example - G4.png|frameless|200x200px]]
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|[[File:Surfscan Low-Particle Example - G2.png|frameless|200x200px]]
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|}
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{| class="wikitable"
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|+A high-particle 4-inch wafer example:
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!Gain 4: Small Particles
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(0.160µm – 1.60µm)
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!Gain 2: Large Particles
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(1.60µm – 28.0µm)
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|-
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|''To Be Added''
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|''To Be Added''
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|}

Revision as of 15:09, 18 November 2021

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Tool Type Inspection, Test and Characterization
Location Bay 5
Supervisor Biljana Stamenic
Supervisor Phone (805) 893-4002
Supervisor E-Mail biljana@ece.ucsb.edu
Description Surface Analysis 
KLA/Tencor Surfscan
Manufacturer Tencor


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.

Documentation


Examples


A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

To Be Added To Be Added
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