Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"

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|picture=KLA.jpg
  
|picture=KLA.jpg
 
|type = Inspection, Test and Characterization
  
|type = Inspection, Test and Characterization
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|super= Tom Reynolds
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|super= Biljana Stamenic
 
|location=Bay 5
  
|location=Bay 5
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|description = ?
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|description = Surface Analysis
  +
KLA/Tencor Surfscan
 
|manufacturer = Tencor
  
|manufacturer = Tencor
 
|materials =
  
|materials =
 
|toolid=
 
|toolid=
 
}}
  
}}
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=About=
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==About==
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This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface.
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This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.
   
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=Documentation=
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==Documentation==
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⚫
*[[media:Surfscan-Operation-Manual.pdf|Operations Manual]]
  
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*[[KLA-Tencor Surfscan - Standard Operating Procedure|Standard Operating Procedure]]
  ⚫
*[https://wiki.nanotech.ucsb.edu/w/images/9/96/Surfscan-Operation-Manual.pdf Operations Manual]
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**''For detailed measurement info, it is highly recommended that you read the manual.''
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*[[Wafer scanning process traveler]]
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*[[Glossary]]
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*[[Errors]]
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  +
<br />
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  +
== Examples ==
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<br />
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{| class="wikitable"
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|+A low-particle 4-inch wafer example:
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!Gain 4: Small Particles
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(0.160µm – 1.60µm)
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!Gain 2: Large Particles
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(1.60µm – 28.0µm)
  +
|-
  +
|[[File:Surfscan Low-Particle Example - G4.png|frameless|200x200px]]
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|[[File:Surfscan Low-Particle Example - G2.png|frameless|200x200px]]
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|}
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{| class="wikitable"
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|+A high-particle 4-inch wafer example:
  +
!Gain 4: Small Particles
  +
(0.160µm – 1.60µm)
  +
!Gain 2: Large Particles
  +
(1.60µm – 28.0µm)
  +
|-
  +
|''To Be Added''
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|''To Be Added''
  +
|}

Revision as of 15:09, 18 November 2021

Surface Analysis (KLA/Tencor Surfscan)
KLA.jpg
Tool Type Inspection, Test and Characterization
Location Bay 5
Supervisor Biljana Stamenic
Supervisor Phone (805) 893-4002
Supervisor E-Mail biljana@ece.ucsb.edu
Description Surface Analysis 
KLA/Tencor Surfscan
Manufacturer Tencor


About

This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.

Documentation


Examples


A low-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

Surfscan Low-Particle Example - G4.png Surfscan Low-Particle Example - G2.png
A high-particle 4-inch wafer example:
Gain 4: Small Particles

(0.160µm – 1.60µm)

Gain 2: Large Particles

(1.60µm – 28.0µm)

To Be Added To Be Added
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