Difference between revisions of "Surface Analysis (KLA/Tencor Surfscan)"
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**''For detailed measurement info, it is highly recommended that you read the manual.'' | **''For detailed measurement info, it is highly recommended that you read the manual.'' | ||
*[//wiki.nanotech.ucsb.edu/w/images/2/27/Surfscan-Surfscan_6200_info.pdf Surfscan Info] | *[//wiki.nanotech.ucsb.edu/w/images/2/27/Surfscan-Surfscan_6200_info.pdf Surfscan Info] | ||
| + | *Wafer scanning process traveler | ||
* | * | ||
=== Screenshots === | === Screenshots === | ||
[[File:UCSBTEST.png|left|thumb|'''UCSBTEST2''' for big size particles '''(1.6-28.0)um''']][[File:UCSBTEST2 for small particles.png|left|thumb|'''UCSBTEST2''' for small size particles '''(0.16-1.6)um''']] | [[File:UCSBTEST.png|left|thumb|'''UCSBTEST2''' for big size particles '''(1.6-28.0)um''']][[File:UCSBTEST2 for small particles.png|left|thumb|'''UCSBTEST2''' for small size particles '''(0.16-1.6)um''']] | ||
Revision as of 15:19, 31 March 2020
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About
This system uses a laser-based scattering method to count size and distribution of particles (or other scattering defects) on a flat wafer surface. It can scan wafers in size from 4 to 8 inches.
Documentation
- Standard Operating Procedure
- Operations Manual
- For detailed measurement info, it is highly recommended that you read the manual.
- Surfscan Info
- Wafer scanning process traveler
