Difference between revisions of "Sputtering Recipes"

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(→‎Ta{{sub|2}}O{{sub|5}} deposition (IBD): added reate, index, stress)
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=[[Sputter 5 (Lesker AXXIS)]]=
 
=[[Sputter 5 (Lesker AXXIS)]]=
 
=[[Ion Beam Deposition (Veeco NEXUS)]]=
 
=[[Ion Beam Deposition (Veeco NEXUS)]]=
[https://docs.google.com/spreadsheet/ccc?key=0AuBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing IBD Calibrations Spreadsheet] - Records of historical film depositions (rates, indices), Uniformity etc.
+
[https://docs.google.com/spreadsheet/ccc?key=0AuBs1GfMrpnXcEdXanZQNko3X0lUcHhVUlNyYnVDUkE&usp=sharing IBD Calibrations Spreadsheet] - Records of historical film depositions (rates, indices), Uniformity etc. '''All users are required to enter their calibration deps (simple test deps only)'''
  
 
==SiO{{sub|2}} deposition (IBD)==
 
==SiO{{sub|2}} deposition (IBD)==
*{{fl|IBD-SiO2-Recipe.pdf|SiO{{Sub|2}} dep}}
 
 
* Refractive Index: ≈1.485  
 
* Refractive Index: ≈1.485  
 
* Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
 
* Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
 
* Stress ≈ -320MPa (compressive)
 
* Stress ≈ -320MPa (compressive)
 +
 +
*{{fl|IBD-SiO2-Recipe.pdf|Recipe: SiO{{Sub|2}}_dep}}
 +
  
 
==SiN deposition (IBD)==
 
==SiN deposition (IBD)==
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* Stress ≈ -1756MPa (compressive)
 
* Stress ≈ -1756MPa (compressive)
  
*{{fl|IBD-SiN-recipe.pdf|SiN Recipe (IBD)}}
+
*{{fl|IBD-SiN-recipe.pdf|Recipe: SiN_dep}}
 
*{{fl|SiNfilm.pdf|SiN Film Data (IBD)}}
 
*{{fl|SiNfilm.pdf|SiN Film Data (IBD)}}
 
*{{fl|SiNrecipedetails.pdf|SiN Recipe Details (IBD)}}
 
*{{fl|SiNrecipedetails.pdf|SiN Recipe Details (IBD)}}
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* Stress ≈ -140MPa (compressive)
 
* Stress ≈ -140MPa (compressive)
  
*{{fl|IBD-Ta2O5-Recipe.pdf|Ta{{sub|2}}O{{sub|5}} dep}}
+
*{{fl|IBD-Ta2O5-Recipe.pdf|Recipe: Ta{{sub|2}}O{{sub|5}}_dep}}
  
 
==TiO{{sub|2}} deposition (IBD)==
 
==TiO{{sub|2}} deposition (IBD)==
*{{fl|IBD-TiO2-Recipe.pdf|TiO{{sub|2}} dep}}
+
*{{fl|IBD-TiO2-Recipe.pdf|Recipe: TiO{{sub|2}}_dep}}

Revision as of 13:10, 13 August 2013

Back to Vacuum Deposition Recipes.

Sputter 1 (Custom)

Sputter 2 (SFI Endeavor)

Sputter 3 (AJA ATC 2000-F)

Sputter 4 (AJA ATC 2200-V)

Sputter 5 (Lesker AXXIS)

Ion Beam Deposition (Veeco NEXUS)

IBD Calibrations Spreadsheet - Records of historical film depositions (rates, indices), Uniformity etc. All users are required to enter their calibration deps (simple test deps only)

SiO2 deposition (IBD)

  • Refractive Index: ≈1.485
  • Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
  • Stress ≈ -320MPa (compressive)


SiN deposition (IBD)

  • Refractive Index ≈ 2.01
  • Rate ≈ 4.5nm/min (users must calibrate this prior to critical deps)
  • Stress ≈ -1756MPa (compressive)

Ta2O5 deposition (IBD)

  • Refractive Index ≈ 2.10
  • Rate ≈7.8nm/min (users must calibrate this prior to critical deps)
  • Stress ≈ -140MPa (compressive)

TiO2 deposition (IBD)