Difference between revisions of "Sputtering Recipes"
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==SiN deposition (IBD)== |
==SiN deposition (IBD)== |
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| + | * Refractive Index ≈ 2.01 |
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| + | * Rate ≈ 4.5nm/min (users must calibrate this prior to critical deps) |
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| + | * Stress ≈ -1756MPa (compressive) |
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*{{fl|IBD-SiN-recipe.pdf|SiN Recipe (IBD)}} |
*{{fl|IBD-SiN-recipe.pdf|SiN Recipe (IBD)}} |
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Revision as of 12:41, 13 August 2013
Back to Vacuum Deposition Recipes.
Sputter 1 (Custom)
Sputter 2 (SFI Endeavor)
Sputter 3 (AJA ATC 2000-F)
Sputter 4 (AJA ATC 2200-V)
Sputter 5 (Lesker AXXIS)
Ion Beam Deposition (Veeco NEXUS)
IBD Calibrations Spreadsheet - Records of historical film depositions (rates, indices), Uniformity etc.
SiO2 deposition (IBD)
- SiO2 dep
- Refractive Index: ≈1.485
- Rate: ≈6.1nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -320MPa (compressive)
SiN deposition (IBD)
- Refractive Index ≈ 2.01
- Rate ≈ 4.5nm/min (users must calibrate this prior to critical deps)
- Stress ≈ -1756MPa (compressive)