https://wiki.nanofab.ucsb.edu/w/index.php?title=Sputter_2_(SFI_Endeavor)&feed=atom&action=history
Sputter 2 (SFI Endeavor) - Revision history
2024-03-28T12:13:23Z
Revision history for this page on the wiki
MediaWiki 1.35.13
https://wiki.nanofab.ucsb.edu/w/index.php?title=Sputter_2_(SFI_Endeavor)&diff=155475&oldid=prev
John d: disclaimer that tool is disabled
2018-09-05T17:28:17Z
<p>disclaimer that tool is disabled</p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 17:28, 5 September 2018</td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=Sputter_2_(SFI_Endeavor)&diff=3744&oldid=prev
Biljana at 18:56, 31 March 2014
2014-03-31T18:56:43Z
<p></p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 18:56, 31 March 2014</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*Chamber 3: DC sputtering of Al or Au. RF back-sputtering with Argon </div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>**Al Dep rate ~ 300-400 nm/min.</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>**Al Dep rate ~ 300-400 nm/min.</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*[[media:SFI Sputter.pdf|Operating Instructions]]</div></td>
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Biljana
https://wiki.nanofab.ucsb.edu/w/index.php?title=Sputter_2_(SFI_Endeavor)&diff=788&oldid=prev
Zwarburg at 20:44, 10 July 2012
2012-07-10T20:44:06Z
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Zwarburg
https://wiki.nanofab.ucsb.edu/w/index.php?title=Sputter_2_(SFI_Endeavor)&diff=784&oldid=prev
Zwarburg at 20:43, 10 July 2012
2012-07-10T20:43:17Z
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Zwarburg
https://wiki.nanofab.ucsb.edu/w/index.php?title=Sputter_2_(SFI_Endeavor)&diff=473&oldid=prev
Zwarburg: Created page with "{{tool|{{PAGENAME}} |picture=Sputter2.jpg |type = Vacuum Deposition |super= Brian Lingg |phone=(805)839-3918x210 |location=Bay 1 |email=lingg@ece.ucsb.edu |description = 3 chambe…"
2012-07-01T18:33:05Z
<p>Created page with "{{tool|{{PAGENAME}} |picture=Sputter2.jpg |type = Vacuum Deposition |super= Brian Lingg |phone=(805)839-3918x210 |location=Bay 1 |email=lingg@ece.ucsb.edu |description = 3 chambe…"</p>
<p><b>New page</b></p><div>{{tool|{{PAGENAME}}<br />
|picture=Sputter2.jpg<br />
|type = Vacuum Deposition<br />
|super= Brian Lingg<br />
|phone=(805)839-3918x210<br />
|location=Bay 1<br />
|email=lingg@ece.ucsb.edu<br />
|description = 3 chamber Cluster Sputter<br />
|manufacturer = Endeavor<br />
|materials = <br />
}}<br />
= About =<br />
<br />
This is a three chamber cluster tool for DC and AC reactive sputtering of metals and dielectrics from 8” cylindrical or 2-piece (for AC) targets. The chamber is configured for 4” diameter wafers or equivalently sized plates that can secure smaller piece samples. Samples are loaded into a cassette system capable of holding 20 wafers. The system is computer controlled through a GUI. Heating of the substrate to several hundred degrees Celcius is possible through a heating lamp module. Chamber 1 is set up for AC reactive sputtering of Al, Al<sub>2</sub>O<sub>3</sub>, AlN, SiO<sub>2</sub>, or SiN. Chamber 2 is set up for DC reactive sputtering of Ti, W, TiN, TiO<sub>2</sub>, and W-based oxides. Chamber 3 is set up for Al or Au metal sputtering and has RF back-sputtering capability on the sample for sample cleaning prior to deposition. <br />
<br />
= Detailed Specifications =<br />
<br />
*Multiple 4” diameter wafer capable system <br />
*Pieces possible through appropriate carrier design <br />
*Full programmable control through GUI <br />
*Heating of substrate to several hundred degrees Celcius <br />
*Chamber 1: AC sputtering of Si, SiN, SiO<sub>2</sub>, AlN, Al<sub>2</sub>O<sub>3</sub> films <br />
**AlN rate ~ 4.5 nm/min. <br />
**Al<sub>2</sub>O<sub>3</sub> ~ 6 nm/min. <br />
**SiO<sub>2</sub> rate ~ 4.5 nm/min. <br />
*Chamber 2: DC sputtering of Ti, TiN, TiO<sub>2</sub>, W, and W-oxides <br />
**Ti rate ~ 200 nm/min. <br />
*Chamber 3: DC sputtering of Al or Au. RF back-sputtering with Argon <br />
**Al Dep rate ~ 300-400 nm/min.</div>
Zwarburg