Difference between revisions of "Spin Rinse Dryer (SemiTool)"

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(added description + capabilities,)
 
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Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.
 
 
Each has a dedicated cassette that can hold up to 25 wafers.
 
 
The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm.  A "Dry Only" option is also available.
 
 
 
{{tool|{{PAGENAME}}
 
{{tool|{{PAGENAME}}
 
|picture=SpinRinse.jpg
 
|picture=SpinRinse.jpg
 
|type = Wet Processing
 
|type = Wet Processing
 
|super= Don Freeborn
 
|super= Don Freeborn
|location=Bay 7
+
|location=Bay 5
 
|description = ?
 
|description = ?
 
|manufacturer =  SemiTool
 
|manufacturer =  SemiTool
 
}}
 
}}
 +
 +
Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.
 +
 +
Each has a dedicated cassette that can hold up to 25 wafers.
 +
 +
The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm.  A "Dry Only" option is also available.

Latest revision as of 09:22, 15 April 2020

Spin Rinse Dryer (SemiTool)
SpinRinse.jpg
Tool Type Wet Processing
Location Bay 5
Supervisor Don Freeborn
Supervisor Phone (805) 893-7975
Supervisor E-Mail dfreeborn@ece.ucsb.edu
Description ?
Manufacturer SemiTool



Two Spin-Rinse Dryers are available, one for 4-inch wafers and one for 6-inch wafers.

Each has a dedicated cassette that can hold up to 25 wafers.

The tool is set up to rinse at ~1000 rpm while spraying DI water, and then Dry in nitrogen at ~2000 rpm. A "Dry Only" option is also available.