Short pages

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Showing below up to 100 results in range #1 to #100.

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  1. (hist) ‎PECVD1-(PlasmaTherm 790) ‎[0 bytes]
  2. (hist) ‎SiN 100C Table-2019 ‎[0 bytes]
  3. (hist) ‎Old training manual ‎[0 bytes]
  4. (hist) ‎Sputter 5 ‎[1 byte]
  5. (hist) ‎Stepper 1 (GCA 6300) Available chucks ‎[3 bytes]
  6. (hist) ‎Unaxis SiN100C 300nm-2019 ‎[6 bytes]
  7. (hist) ‎InP Etch test -details ‎[7 bytes]
  8. (hist) ‎InP Etch Test-in details ‎[7 bytes]
  9. (hist) ‎Stepper 2 (AutoStep 200) - Operating Procedure - Piece Parts ‎[7 bytes]
  10. (hist) ‎PECVD.docx ‎[14 bytes]
  11. (hist) ‎Advanced PECVD Recipes ‎[21 bytes]
  12. (hist) ‎PECV1 Wafer Coating Process Traveler ‎[21 bytes]
  13. (hist) ‎UCSBTEST1Gain4.jpg ‎[21 bytes]
  14. (hist) ‎AUTOSTEP 200-PIECES instruction 6-20-19.pptx ‎[26 bytes]
  15. (hist) ‎Molecular Vapor Deposition Recipes ‎[29 bytes]
  16. (hist) ‎Unaxis SOP 3-12-2020.docx ‎[29 bytes]
  17. (hist) ‎PECVD1-SiN-standard recipe.pdf ‎[30 bytes]
  18. (hist) ‎Surfscan photo ‎[32 bytes]
  19. (hist) ‎E-BEAM ‎[45 bytes]
  20. (hist) ‎Flood Exposure Recipes ‎[46 bytes]
  21. (hist) ‎Exposing a wafer piece ‎[48 bytes]
  22. (hist) ‎Surfscan6200 photos ‎[59 bytes]
  23. (hist) ‎Errors ‎[59 bytes]
  24. (hist) ‎AUTOSTEP 200-PIECES 1st litho BL and BR orientation.pptx ‎[60 bytes]
  25. (hist) ‎Operating Instructions ‎[61 bytes]
  26. (hist) ‎PECVD1 Operating Instructions.pdf ‎[68 bytes]
  27. (hist) ‎Wafer coating procedure ‎[68 bytes]
  28. (hist) ‎STD SiO2 recipe ‎[72 bytes]
  29. (hist) ‎Test Page ‎[88 bytes]
  30. (hist) ‎ADT UV-Tape Table 1042R ‎[89 bytes]
  31. (hist) ‎PECVD1-SiN standard recipe.pdf ‎[90 bytes]
  32. (hist) ‎InP Etch Test Result in Details ‎[90 bytes]
  33. (hist) ‎InP etch result in details ‎[94 bytes]
  34. (hist) ‎GCA Old full training manual ‎[98 bytes]
  35. (hist) ‎ProcessGroup: Shipping Samples on Dicing Tape+Frame ‎[113 bytes]
  36. (hist) ‎SPR220-7 at 3kW various temperature without N2 gas ‎[118 bytes]
  37. (hist) ‎Old Training Manual ‎[120 bytes]
  38. (hist) ‎Autostep 200 Old training manual ‎[120 bytes]
  39. (hist) ‎TEST PAGE ‎[126 bytes]
  40. (hist) ‎Surfscan Errors and Workarounds ‎[133 bytes]
  41. (hist) ‎YES-SPR220-Various-Temps ‎[135 bytes]
  42. (hist) ‎Jack Whaley ‎[144 bytes]
  43. (hist) ‎Adam Abrahamsen ‎[149 bytes]
  44. (hist) ‎Comparison of ash rate for different gas mixtures, especially between O2 only vs O2/N2 mixture. ‎[149 bytes]
  45. (hist) ‎Vacuum Sealer ‎[172 bytes]
  46. (hist) ‎PECVD1-SIN Standard Recipe (PlasmaTherm 790) ‎[174 bytes]
  47. (hist) ‎THz Physics Presentations ‎[186 bytes]
  48. (hist) ‎E-Beam Lithography Recipes ‎[187 bytes]
  49. (hist) ‎Unaxis Test Recipe Page ‎[208 bytes]
  50. (hist) ‎Gold surface oxidation (darkening) due to O2/N2 plasma; the need for O2 only recipe. ‎[223 bytes]
  51. (hist) ‎Michael Barreraz ‎[234 bytes]
  52. (hist) ‎Tino Sy ‎[235 bytes]
  53. (hist) ‎Mike Day ‎[241 bytes]
  54. (hist) ‎Luis Zuzunaga ‎[252 bytes]
  55. (hist) ‎SiO2 Etching Test using CF4/CHF3 ‎[259 bytes]
  56. (hist) ‎Foong Fatt ‎[260 bytes]
  57. (hist) ‎Test Data of etching SiO2 with CHF3/CF4-Florine ‎[264 bytes]
  58. (hist) ‎Dan Read ‎[275 bytes]
  59. (hist) ‎Peder Lenvik ‎[289 bytes]
  60. (hist) ‎Test Data of etching SiO2 with CHF3/CF4/O2 ‎[293 bytes]
  61. (hist) ‎Ovens 1, 2 & 3 (Labline) ‎[301 bytes]
  62. (hist) ‎Mike Silva ‎[309 bytes]
  63. (hist) ‎Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher ‎[322 bytes]
  64. (hist) ‎Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher ‎[322 bytes]
  65. (hist) ‎Vraj Mehalana ‎[332 bytes]
  66. (hist) ‎Thermal Evaporator 2 ‎[357 bytes]
  67. (hist) ‎Nanofab-IT - Add Device to Network ‎[360 bytes]
  68. (hist) ‎Vacuum Oven (YES) ‎[378 bytes]
  69. (hist) ‎Intellemetrics Laser Etch Monitor Procedure for Plasma-Therm Etchers ‎[422 bytes]
  70. (hist) ‎Critical Point Dryer ‎[430 bytes]
  71. (hist) ‎Bill Mitchell ‎[436 bytes]
  72. (hist) ‎YES-150C-Various-Resists ‎[464 bytes]
  73. (hist) ‎Spin Rinse Dryer (SemiTool) ‎[470 bytes]
  74. (hist) ‎Older Publications ‎[481 bytes]
  75. (hist) ‎ADT 7100 - Recovering an Old Recipe (2019) ‎[487 bytes]
  76. (hist) ‎Claudia Gutierrez ‎[487 bytes]
  77. (hist) ‎Brian Lingg ‎[503 bytes]
  78. (hist) ‎MA6 Backside Alignment - Allowed Mark Locations ‎[504 bytes]
  79. (hist) ‎Electronics Presentations ‎[535 bytes]
  80. (hist) ‎Don Freeborn ‎[543 bytes]
  81. (hist) ‎DS-K101-304 Bake Temp. versus Develop Rate ‎[543 bytes]
  82. (hist) ‎Oven 5 (Labline) ‎[550 bytes]
  83. (hist) ‎Wire Saw (Takatori) ‎[553 bytes]
  84. (hist) ‎Lab Rules OLD 2018 ‎[574 bytes]
  85. (hist) ‎ASML 5500: Recovering from a Typo in Reticle ID ‎[576 bytes]
  86. (hist) ‎High Temp Oven (Blue M) ‎[647 bytes]
  87. (hist) ‎YES Recipe Screenshots: STD-O2 ‎[669 bytes]
  88. (hist) ‎Test Data of etching SiO2 with CHF3/CF4/O2 (using this recipe only for Fluorine etch of the underneath layer) ‎[707 bytes]
  89. (hist) ‎Lee Sawyer ‎[716 bytes]
  90. (hist) ‎YES Recipe Screenshots: STD-N2-O2 ‎[725 bytes]
  91. (hist) ‎Mechanical Polisher (Allied) ‎[734 bytes]
  92. (hist) ‎MVD - Wafer Coating - Process Traveler ‎[775 bytes]
  93. (hist) ‎ASML Stepper 3 - Substrates smaller than 100mm/4-inch ‎[790 bytes]
  94. (hist) ‎Gold Plating Bench ‎[803 bytes]
  95. (hist) ‎Tube Furnace AlGaAs Oxidation (Lindberg) ‎[810 bytes]
  96. (hist) ‎Logitech WBS7 - Procedure for Wax Mounting with Spin-On Crystalbond ‎[823 bytes]
  97. (hist) ‎Photonics Presentations ‎[837 bytes]
  98. (hist) ‎Bill Millerski ‎[848 bytes]
  99. (hist) ‎Field Emission SEM 2 (JEOL IT800SHL) ‎[850 bytes]
  100. (hist) ‎Tony Bosch ‎[851 bytes]

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