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  • |email = mitchell@ece.ucsb.edu
    436 bytes (50 words) - 11:32, 23 March 2020

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  • |email = mitchell@ece.ucsb.edu
    436 bytes (50 words) - 11:32, 23 March 2020
  • |super= Bill Mitchell |email=mitchell@ece.ucsb.edu
    2 KB (298 words) - 11:11, 30 November 2018
  • |[[Bill Mitchell]]||Process Expert||(805) 893-4974||mitchell@ece.ucsb.edu
    5 KB (630 words) - 10:02, 14 September 2021
  • ...this tool, as achieving the atomic-layer regime is rather complex. [[Bill Mitchell]] is the resident expert on ALD recipe development.
    3 KB (362 words) - 07:57, 1 July 2020
  • **''Ning Cao & Bill Mitchell, 2019-06'' ...ertical Etch of Silicon Dioxide using Ruthenium Films as an Etch Mask|W.J. Mitchell ''et al.'', JVST-A, May 2021]]
    15 KB (2,339 words) - 14:01, 8 October 2021
  • |super= Bill Mitchell
    5 KB (733 words) - 10:52, 5 November 2020
  • # Andrew D. Carter, J. J. M. Law, E. Lobisser, G. J. Burek, W. J. Mitchell, B. J. Thibeault, A. C. Gossard, and M. J. W. Rodwell, " 60 nm gate length # Andrew D. Carter, Jeremy J. M. Law, William Mitchell, Gregory J. Burek, Brian J. Thibeault, Arthur C. Gossard, Mark. J. W. Rodwe
    100 KB (14,246 words) - 16:34, 4 March 2020
  • |A. Boes, B. Corcoran, L. Chang, J. Bowers, and A. Mitchell
    77 KB (11,491 words) - 16:10, 27 November 2019