Recent changes

Jump to navigation Jump to search

Track the most recent changes to the wiki on this page.

Recent changes options Show last 50 | 100 | 250 | 500 changes in last 1 | 3 | 7 | 14 | 30 days
Hide registered users | Hide anonymous users | Hide my edits | Show bots | Hide minor edits
Show new changes starting from 13:46, 20 May 2022
   
List of abbreviations:
N
This edit created a new page (also see list of new pages)
m
This is a minor edit
b
This edit was performed by a bot
(±123)
The page size changed by this number of bytes

20 May 2022

 m   10:46  ICP-PECVD (Unaxis VLR) diffhist +13 John d talk contribs →‎Detailed Specifications Tag: Visual edit

19 May 2022

     21:12  Template:Announcements diffhist -193 John d talk contribs AFM up, deleted F10, LEXT
     20:58  Oxford ICP Etcher - Process Control Data‎‎ 7 changes history +773 [John d‎ (7×)]
 m   
20:58 (cur | prev) 0 John d talk contribs Tag: Visual edit
     
20:56 (cur | prev) +43 John d talk contribs updated SEM links to state "45°" or "XS" Tag: Visual edit
 m   
20:43 (cur | prev) 0 John d talk contribs Tag: Visual edit
     
20:42 (cur | prev) +125 John d talk contribs uploaded SEMs Tag: Visual edit
     
09:27 (cur | prev) +153 John d talk contribs added etch cal, SEMs TBA Tag: Visual edit
     
09:15 (cur | prev) +156 John d talk contribs added "sample prep" section - still needs solution detials added Tag: Visual edit
     
08:43 (cur | prev) +296 John d talk contribs Added dummy InP and seasoning steps Tag: Visual edit
     20:42  (Upload log) [John d‎ (3×)]
     
20:42 John d talk contribs uploaded File:Oxford InP 60C XS05.jpg
     
20:41 John d talk contribs uploaded File:Oxford InP 60C 45DEG05.jpg
     
20:39 John d talk contribs uploaded File:Oxford InP 60C 45DEG02.jpg

18 May 2022

     17:16  Probe Station & Curve Tracer diffhist -111 John d talk contribs deleted old DMM - removed form setup (didn't work) Tag: Visual edit
 m   10:43  Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher diffhist +247 Pakala talk contribs still a low etch rate on new fl cal Tag: Visual edit
     10:41  (Upload log) [Pakala‎ (2×)]
     
10:41 Pakala talk contribs uploaded File:SiO2 Fl 10 CS 007.jpg
     
10:41 Pakala talk contribs uploaded File:SiO2 Fl 10 45D-003.jpg

13 May 2022

     07:30  Optical Film Thickness (Nanometric) diffhist +100 John d talk contribs note to use FIlmtrics F40, and locaiton=Removed From Lab Tag: Visual edit
     07:28  Tool List‎‎ 2 changes history -122 [John d‎ (2×)]
     
07:28 (cur | prev) -41 John d talk contribs →‎Thickness + Optical Constants: Deleted Nanometrics (removed from lab) Tag: Visual edit
     
07:26 (cur | prev) -81 John d talk contribs →‎Thin-Film/Material Analysis: deleted FIlmetrics F20 Tag: Visual edit
     07:27  Optical Film Thickness (Filmetrics) diffhist +148 John d talk contribs tool decomissioned notice,locaiton="removed from lab" Tag: Visual edit

12 May 2022

 m   10:48  Oxford ICP Etcher - Process Control Data‎‎ 2 changes history +225 [Pakala‎ (2×)]
 m   
10:48 (cur | prev) +186 Pakala talk contribs added new cal to oxford 60c Tag: Visual edit
 m   
09:02 (cur | prev) +39 Pakala talk contribs started to enter new cal on oxford60c Tag: Visual edit
     10:47  (Upload log) [Pakala‎ (2×)]
     
10:47 Pakala talk contribs uploaded File:Oxford 60c 10 CS 008.jpg
     
10:47 Pakala talk contribs uploaded File:Oxford 60c 10 45D 003.jpg

11 May 2022

     11:39  Services diffhist +101 John d talk contribs link to hourly rates Tag: Visual edit
     11:33  Template:Announcements‎‎ 5 changes history -417 [Thibeault‎ (2×); John d‎ (3×)]
 m   
11:33 (cur | prev) -34 John d talk contribs →‎AFM: DOWN: fix link
 m   
11:33 (cur | prev) +86 John d talk contribs →‎AFM: DOWN: link to tool
     
11:32 (cur | prev) +124 John d talk contribs AFM down
     
10:21 (cur | prev) -4 Thibeault talk contribs
     
10:20 (cur | prev) -589 Thibeault talk contribs
 m   10:36  Test Data of etching SiO2 with CHF3/CF4 diffhist +16 Pakala talk contribs added selectivity to ICP2 cals Tag: Visual edit
 m   10:33  Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher diffhist +241 Pakala talk contribs addded entry to fl cals, added selectivity. etch rate is 10% lower Tag: Visual edit
     10:28  (Upload log) [Pakala‎ (4×)]
     
10:28 Pakala talk contribs uploaded File:SiO2 Fl 09 CS 006.jpg
     
10:28 Pakala talk contribs uploaded File:SiO2 Fl 09 45D 005.jpg
     
10:20 Pakala talk contribs uploaded File:ICP1 07 CS 006.jpg
     
10:20 Pakala talk contribs uploaded File:ICP1 07 45D 008.jpg
 m   10:24  Test Data of etching SiO2 with CHF3/CF4-ICP1 diffhist +227 Pakala talk contribs added entry in ICP1 cals, added selectivity Tag: Visual edit

10 May 2022

N    17:32  Process Group - Process Control Data‎‎ 2 changes history +4,216 [John d‎ (2×)]
     
17:32 (cur | prev) +912 John d talk contribs →‎Etching: links to all etching process control pages Tag: Visual edit
N    
17:17 (cur | prev) +3,304 John d talk contribs Links to all PECVD and IBD data pages Tag: Visual edit
 m   17:27  ICP Etching Recipes‎‎ 2 changes history -175 [John d‎ (2×)]
 m   
17:27 (cur | prev) -27 John d talk contribs Renaming Process Control Data Tag: Visual edit
 m   
17:25 (cur | prev) -148 John d talk contribs renamed "historical data" to "process control" data Tag: Visual edit
     17:18  Sputtering Recipes‎‎ 4 changes history +93 [John d‎ (4×)]
 m   
17:18 (cur | prev) -6 John d talk contribs →‎Ion Beam Deposition (Veeco NEXUS) Tag: Visual edit
     
17:18 (cur | prev) -2 John d talk contribs →‎Ion Beam Deposition (Veeco NEXUS): changed style to Page Title Tag: Visual edit
 m   
17:16 (cur | prev) +71 John d talk contribs minor updates Tag: Visual edit
     
17:06 (cur | prev) +30 John d talk contribs →‎Ion Beam Deposition (Veeco NEXUS): rename process control plots for clarity Tag: Visual edit
     17:15  Ion Beam Deposition (Veeco NEXUS) diffhist +12 John d talk contribs →‎Detailed Specifications: mentioned ITO not installed, minor formatting Tag: Visual edit
     17:01  PECVD Recipes diffhist -23 John d talk contribs renamed Process Control plots for clarity Tag: Visual edit
     16:35  Nanofab Staff Internal Pages diffhist +135 John d talk contribs →‎Process Group: link to Process Control Data Tag: Visual edit
 m   08:58  Test Data of etching SiO2 with CHF3/CF4 diffhist 0 Pakala talk contribs fixed typo on icp2 cals Tag: Visual edit
     07:24  Template:Announcements diffhist -108 John d talk contribs F50 up