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- 10:34, 9 March 2022 diff hist 0 N File:SiO2 Fl 04 CS 005.jpg current
- 10:33, 9 March 2022 diff hist 0 N File:SiO2 FL 04 45D 001.jpg current
- 12:09, 8 March 2022 diff hist +212 m Test Data of etching SiO2 with CHF3/CF4 added entry to ICP2 historical data Tag: Visual edit
- 12:09, 8 March 2022 diff hist 0 N File:ICP2 01 CS 007.jpg current
- 12:08, 8 March 2022 diff hist 0 N File:ICP2 01 45D 002.jpg current
- 12:05, 8 March 2022 diff hist +212 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry to ICP1 historical data Tag: Visual edit
- 12:04, 8 March 2022 diff hist 0 N File:ICP1 01 CS 003.jpg current
- 12:04, 8 March 2022 diff hist 0 N File:ICP1 01 45D 001.jpg current
- 11:56, 8 March 2022 diff hist +190 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher added new entry + SEM into Fl etcher historical data Tag: Visual edit
- 11:55, 8 March 2022 diff hist 0 N File:SiO2 Fl 03 CS 001.jpg current
- 11:55, 8 March 2022 diff hist 0 N File:SiO2 Fl 03 45D 001.jpg current
- 10:59, 2 March 2022 diff hist +504 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher Added SEMs and some notes to new etch cals done on FL etcher Tag: Visual edit
- 10:57, 2 March 2022 diff hist 0 N File:SiO2 Fl 01 45D 002.jpg current
- 10:55, 2 March 2022 diff hist 0 N File:SiO2 Fl 02 CS 001.jpg current
- 10:55, 2 March 2022 diff hist 0 N File:SiO2 Fl 02 45D 001.jpg current
- 08:33, 15 February 2022 diff hist -15 m Oxford ICP Etcher - Process Control Data added new images Tag: Visual edit
- 08:33, 15 February 2022 diff hist 0 N File:Oxford Cal 01 26 22 New002 CS 002.jpg current
- 08:31, 15 February 2022 diff hist +109 m Oxford ICP Etcher - Process Control Data updated etch rates and selectivity Tag: Visual edit
- 08:13, 15 February 2022 diff hist -79 m Oxford ICP Etcher - Process Control Data updated images Tag: Visual edit
- 08:11, 15 February 2022 diff hist +88 m Oxford ICP Etcher - Process Control Data updated some images Tag: Visual edit