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- 10:43, 18 May 2022 diff hist +247 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher still a low etch rate on new fl cal Tag: Visual edit
- 10:41, 18 May 2022 diff hist 0 N File:SiO2 Fl 10 CS 007.jpg current
- 10:41, 18 May 2022 diff hist 0 N File:SiO2 Fl 10 45D-003.jpg current
- 10:48, 12 May 2022 diff hist +186 m Oxford ICP Etcher - Process Control Data added new cal to oxford 60c Tag: Visual edit
- 10:47, 12 May 2022 diff hist 0 N File:Oxford 60c 10 CS 008.jpg current
- 10:47, 12 May 2022 diff hist 0 N File:Oxford 60c 10 45D 003.jpg current
- 09:02, 12 May 2022 diff hist +39 m Oxford ICP Etcher - Process Control Data started to enter new cal on oxford60c Tag: Visual edit
- 10:36, 11 May 2022 diff hist +16 m Test Data of etching SiO2 with CHF3/CF4 added selectivity to ICP2 cals Tag: Visual edit
- 10:33, 11 May 2022 diff hist +241 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher addded entry to fl cals, added selectivity. etch rate is 10% lower Tag: Visual edit
- 10:28, 11 May 2022 diff hist 0 N File:SiO2 Fl 09 CS 006.jpg current
- 10:28, 11 May 2022 diff hist 0 N File:SiO2 Fl 09 45D 005.jpg current
- 10:24, 11 May 2022 diff hist +227 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry in ICP1 cals, added selectivity Tag: Visual edit
- 10:20, 11 May 2022 diff hist 0 N File:ICP1 07 CS 006.jpg current
- 10:20, 11 May 2022 diff hist 0 N File:ICP1 07 45D 008.jpg current
- 08:58, 10 May 2022 diff hist 0 m Test Data of etching SiO2 with CHF3/CF4 fixed typo on icp2 cals Tag: Visual edit
- 12:01, 5 May 2022 diff hist +233 m Oxford ICP Etcher - Process Control Data added new entry to oxford 60c cal Tag: Visual edit
- 11:59, 5 May 2022 diff hist 0 N File:InP Oxford 60c 09 CS 005.jpg current
- 11:59, 5 May 2022 diff hist 0 N File:InP Oxford 60c 09 45D 005.jpg current
- 11:53, 5 May 2022 diff hist +264 Test Data of etching SiO2 with CHF3/CF4 Added new entry to ICP2 cals -- after chuck temperature was lowered Tag: Visual edit
- 11:51, 5 May 2022 diff hist 0 N File:ICP2 07 CS 005.jpg current
- 11:50, 5 May 2022 diff hist 0 N File:ICP2 07 45D 002.jpg current
- 09:09, 4 May 2022 diff hist +220 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher added entry to FL cals Tag: Visual edit
- 09:08, 4 May 2022 diff hist 0 N File:SiO2 Fl 08 CS 005.jpg current
- 09:07, 4 May 2022 diff hist 0 N File:SiO2 Fl 08 45D 004.jpg current
- 14:15, 28 April 2022 diff hist +220 m Unaxis VLR Etch - Process Control Data added new entry to unaxis cals Tag: Visual edit
- 14:13, 28 April 2022 diff hist 0 N File:Unaxis 03 CS 003.jpg current
- 14:12, 28 April 2022 diff hist 0 N File:Unaxis 03 45D 003.jpg current
- 14:09, 28 April 2022 diff hist +202 m Oxford ICP Etcher - Process Control Data added entry to Oxford 60c cals Tag: Visual edit
- 14:04, 28 April 2022 diff hist 0 N File:Oxford 60c 08 CS 009.jpg current
- 14:04, 28 April 2022 diff hist 0 N File:Oxford 60c 08 45D 003.jpg current
- 11:08, 27 April 2022 diff hist +3,202 m Unaxis VLR Etch - Process Control Data merged the two sets of ICP cal data Tag: Visual edit
- 13:32, 26 April 2022 diff hist +299 m Oxford ICP Etcher - Process Control Data added new entry to oxford 60c cal Tag: Visual edit
- 13:31, 26 April 2022 diff hist 0 N File:Oxford 60c 07 CS 001.jpg current
- 13:30, 26 April 2022 diff hist 0 N File:Oxford 60c 07 45D 002.jpg current
- 13:27, 26 April 2022 diff hist +215 m Test Data of etching SiO2 with CHF3/CF4 added new entry to ICP2 cals Tag: Visual edit
- 13:26, 26 April 2022 diff hist 0 N File:ICP2 06 CS 001.jpg current
- 13:26, 26 April 2022 diff hist 0 N File:ICP2 06 45D 002.jpg current
- 13:24, 26 April 2022 diff hist +213 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry to ICP1 cals Tag: Visual edit
- 13:23, 26 April 2022 diff hist 0 N File:ICP1 06 CS 002.jpg current
- 13:22, 26 April 2022 diff hist 0 N File:ICP1 06 45D 002.jpg current
- 11:20, 21 April 2022 diff hist +13 m Unaxis VLR Etch - Process Control Data edited recipe on Unaxis Process control data Tag: Visual edit
- 11:17, 21 April 2022 diff hist +3 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher fixed typo Tag: Visual edit
- 11:09, 21 April 2022 diff hist +219 m Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher added entry to FL cals Tag: Visual edit
- 11:08, 21 April 2022 diff hist 0 N File:SiO2 Fl 07 CS 004.jpg current
- 11:07, 21 April 2022 diff hist 0 N File:SiO2 Fl 07 45D 003.jpg current
- 11:02, 21 April 2022 diff hist +210 m Test Data of etching SiO2 with CHF3/CF4 added new entry to ICP2 cals Tag: Visual edit
- 11:01, 21 April 2022 diff hist 0 N File:ICP2 05 CS 001.jpg current
- 11:00, 21 April 2022 diff hist 0 N File:ICP2 05 45D 003.jpg current
- 10:58, 21 April 2022 diff hist +211 m Test Data of etching SiO2 with CHF3/CF4-ICP1 added entry to ICP1 cals Tag: Visual edit
- 10:57, 21 April 2022 diff hist 0 N File:ICP1 05 CS 002.jpg current