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- 18:28, 22 July 2021 diff hist +59 Test Data of etching SiO2 with CHF3/CF4 adding a SEM pic Tag: Visual edit
- 18:27, 22 July 2021 diff hist 0 N File:I2210308.pdf current
- 18:21, 22 July 2021 diff hist +37 Test Data of etching SiO2 with CHF3/CF4 adding a data point Tag: Visual edit
- 19:30, 19 May 2021 diff hist +17 Test Data of etching SiO2 with CHF3/CF4 add a data point Tag: Visual edit
- 19:08, 19 May 2021 diff hist +59 Test Data of etching SiO2 with CHF3/CF4 add a SEM Tag: Visual edit
- 19:06, 19 May 2021 diff hist 0 N File:I2210214.pdf current
- 19:05, 19 May 2021 diff hist +37 Test Data of etching SiO2 with CHF3/CF4 add a new data point Tag: Visual edit
- 18:00, 8 April 2021 diff hist -45 m Lithography Recipes →Holography Recipes
- 17:55, 8 April 2021 diff hist +46 m Lithography Recipes →Holography Recipes
- 17:54, 8 April 2021 diff hist 0 N File:Holography Process for 1D-lines and 2D-dots (ARC-11 & THMR-IP3600HP-D)-updated-4-8-2021.pdf current
- 16:32, 4 February 2021 diff hist +23 Dry Etching Recipes
- 16:16, 4 February 2021 diff hist +59 Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher Tag: Visual edit
- 16:14, 4 February 2021 diff hist +260 N Test Data of Etching SiO2 with CHF3/CF4-Fluorine ICP Etcher Created page with "{| class="wikitable" | colspan="6" |Fluorine ICP: 3.8mT, 50/800W, CHF3/CF4=10/30sccm, time=90 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Average..." Tag: Visual edit
- 16:12, 4 February 2021 diff hist +1 ICP Etching Recipes →SiO2 Etch Historical Data Tag: Visual edit
- 16:07, 4 February 2021 diff hist +1 ICP Etching Recipes →SiO2 Etch Historical Data
- 18:33, 3 February 2021 diff hist +59 InP Etch Rate and Selectivity (InP/SiO2) add another pic Tag: Visual edit
- 18:32, 3 February 2021 diff hist 0 N File:IP210119.pdf current
- 18:32, 3 February 2021 diff hist +59 InP Etch Rate and Selectivity (InP/SiO2) add a pic Tag: Visual edit
- 18:31, 3 February 2021 diff hist 0 N File:IP210117.pdf current
- 18:28, 3 February 2021 diff hist +35 InP Etch Rate and Selectivity (InP/SiO2) add a data point Tag: Visual edit
- 18:43, 2 February 2021 diff hist 0 ICP Etching Recipes →Historical Data (SiO2, Florine ICP Etcher) Tag: Visual edit
- 18:39, 2 February 2021 diff hist +19 ICP Etching Recipes →Historical Data (SiO2, Florine ICP Etcher) Tag: Visual edit
- 18:37, 2 February 2021 diff hist +59 Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher current Tag: Visual edit
- 18:36, 2 February 2021 diff hist +4 Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher Tag: Visual edit
- 18:36, 2 February 2021 diff hist +259 N Test Data of etching SiO2 with CHF3/CF4-Florine ICP Etcher Created page with "{| class="wikitable" | colspan="6" |Florine ICP: 3.8mT, 50/800W, CHF3/CF4=10/30sccm, time=90 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Averaged..." Tag: Visual edit
- 18:35, 2 February 2021 diff hist +11 ICP Etching Recipes →Historical Data (SiO2, Florine ICP Etcher) Tag: Visual edit
- 18:33, 2 February 2021 diff hist +4 Test Data of etching SiO2 with CHF3/CF4-Florine current Tag: Visual edit
- 18:30, 2 February 2021 diff hist +4 Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher current Tag: Visual edit
- 18:29, 2 February 2021 diff hist +59 Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher adding a SEM Tag: Visual edit
- 18:27, 2 February 2021 diff hist 0 N File:FE210206.pdf current
- 18:18, 2 February 2021 diff hist +259 N Test Data of Etching SiO2 with CHF3/CF4-Florine ICP Etcher Created page with "{| class="wikitable" | colspan="6" |Florine ICP: 3.8mT, 50/800W, CHF3/CF4=10/30sccm, time=90 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Averaged..." Tag: Visual edit
- 16:53, 2 February 2021 diff hist +16 Test Data of etching SiO2 with CHF3/CF4-Florine Tag: Visual edit
- 16:50, 2 February 2021 diff hist -6 Test Data of etching SiO2 with CHF3/CF4-Florine Tag: Visual edit
- 16:47, 2 February 2021 diff hist +250 N Test Data of etching SiO2 with CHF3/CF4-Florine Created page with "{| class="wikitable" | colspan="5" |ICP#2: 0.5Pa, 50/500W, CHF3/CF4/O2=35/5/10sccm, time=210 sec |- |Date |Sample# |Etch Rate (nm/min) |Etch Selectivity (SiO2/PR) |Averaged..." Tag: Visual edit
- 16:39, 2 February 2021 diff hist +52 ICP Etching Recipes →Historical Data (SiO2, Florine ICP Etcher) Tag: Visual edit
- 16:26, 2 February 2021 diff hist -1 ICP Etching Recipes →Historical Data (SiO2, Florine ICP Etcher)
- 16:25, 2 February 2021 diff hist +53 ICP Etching Recipes →Historical Data (SiO2, Florines ICP Etcher)
- 16:22, 2 February 2021 diff hist +49 ICP Etching Recipes →PlasmaTherm/SLR Fluorine Etcher
- 19:42, 8 January 2021 diff hist +59 Test Data of etching SiO2 with CHF3/CF4 add a SEM pic Tag: Visual edit
- 19:41, 8 January 2021 diff hist 0 N File:I2210102.pdf current
- 19:39, 8 January 2021 diff hist +59 Test Data of etching SiO2 with CHF3/CF4-ICP1 add a SEM pic Tag: Visual edit
- 19:37, 8 January 2021 diff hist 0 N File:I1210113.pdf current
- 17:45, 8 January 2021 diff hist +36 Test Data of etching SiO2 with CHF3/CF4 adding a data point Tag: Visual edit
- 17:44, 8 January 2021 diff hist +36 Test Data of etching SiO2 with CHF3/CF4-ICP1 add a data poing Tag: Visual edit
- 18:55, 30 August 2020 diff hist +59 InP Etch Rate and Selectivity (InP/SiO2) add a Sem PIC Tag: Visual edit
- 18:54, 30 August 2020 diff hist 0 N File:IP020104.pdf current
- 18:50, 30 August 2020 diff hist +38 InP Etch Rate and Selectivity (InP/SiO2) add a data point Tag: Visual edit
- 17:21, 10 August 2020 diff hist +10 Test Data of etching SiO2 with CHF3/CF4 Tag: Visual edit
- 17:21, 10 August 2020 diff hist +27 Test Data of etching SiO2 with CHF3/CF4 a comment added Tag: Visual edit
- 17:19, 10 August 2020 diff hist +59 Test Data of etching SiO2 with CHF3/CF4 add a SEM Tag: Visual edit