Difference between revisions of "RIE Etching Recipes"

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(Photoresist and ARC: added tool name to header title)
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=[[RIE 2 (MRC)]] =
 
=[[RIE 2 (MRC)]] =
 
==CdZnTe Etching (RIE 2)==
 
==CdZnTe Etching (RIE 2)==
*[[media:11-CZT etching-1.pdf|CdZnTe Etch Recipes - CH<sub>4</sub>-H<sub>2</sub>-Ar]]
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*[//wiki.nanotech.ucsb.edu/w/images/f/f5/11-CZT_etching-1.pdf CdZnTe Etch Recipes - CH<sub>4</sub>-H<sub>2</sub>-Ar]
   
 
==ZnS Etching (RIE 2)==
 
==ZnS Etching (RIE 2)==
*[[media:ZnS Plasma Etch-1.pdf|ZnS Etch Recipe - CH<sub>4</sub>-H<sub>2</sub>-Ar]]
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*[//wiki.nanotech.ucsb.edu/w/images/b/b4/ZnS_Plasma_Etch-1.pdf ZnS Etch Recipe - CH<sub>4</sub>-H<sub>2</sub>-Ar]
   
 
==ITO Etching (RIE 2)==
 
==ITO Etching (RIE 2)==
*[[media:RIE2-ITO-Etch-MHA-Plasma-RevA.pdf|ITO Etch Recipes - CH<sub>4</sub>-H<sub>2</sub>-Ar]]
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*[//wiki.nanotech.ucsb.edu/w/images/f/f4/RIE2-ITO-Etch-MHA-Plasma-RevA.pdf ITO Etch Recipes - CH<sub>4</sub>-H<sub>2</sub>-Ar]
   
 
==InP-InGaAsP-InGaAlAs Etching (RIE 2)==
 
==InP-InGaAsP-InGaAlAs Etching (RIE 2)==
*[[media:RIE2-InGaAs-InP-InAlAs-Etch-Plasma-RIE-RevA.pdf|InP-InGaAsP-InAlGaAs Etch Recipes - CH<sub>4</sub>-H<sub>2</sub>-Ar]]
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*[//wiki.nanotech.ucsb.edu/w/images/6/6f/RIE2-InGaAs-InP-InAlAs-Etch-Plasma-RIE-RevA.pdf InP-InGaAsP-InAlGaAs Etch Recipes - CH<sub>4</sub>-H<sub>2</sub>-Ar]
   
 
=[[RIE 3 (MRC)]] =
 
=[[RIE 3 (MRC)]] =
 
==SiO<sub>2</sub> Etching (RIE 3)==
 
==SiO<sub>2</sub> Etching (RIE 3)==
*[[media:SiO2-Etch-Recipe-using-RIE-3-a.pdf|SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]]
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*[//wiki.nanotech.ucsb.edu/w/images/2/2f/SiO2-Etch-Recipe-using-RIE-3-a.pdf SiO<sub>2</sub> Etch Recipe with a very low surface damage - CHF<sub>3]
 
==SiN<sub>x</sub> Etching (RIE 3)==
 
==SiN<sub>x</sub> Etching (RIE 3)==
*[[media:51-SiNx-Etch-Recipe-using-RIE3.pdf|SiN<sub>x</sub> Etch Recipe with a very low surface damage - CHF<sub>3]]
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*[//wiki.nanotech.ucsb.edu/w/images/9/98/51-SiNx-Etch-Recipe-using-RIE3.pdf SiN<sub>x</sub> Etch Recipe with a very low surface damage - CHF<sub>3]
   
 
=[[RIE 5 (PlasmaTherm)]] =
 
=[[RIE 5 (PlasmaTherm)]] =
 
==AlGaAs\GaAs Etching (RIE 5)==
 
==AlGaAs\GaAs Etching (RIE 5)==
*[[media:13-GaAs-AlGaAs Etching-RIE-5.pdf|GaAs\AlGaAs Etch Recipes - BCl<sub>3</sub>-SiCl<sub>4</sub>]]
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*[//wiki.nanotech.ucsb.edu/w/images/b/b5/13-GaAs-AlGaAs_Etching-RIE-5.pdf GaAs\AlGaAs Etch Recipes - BCl<sub>3</sub>-SiCl<sub>4</sub>]
   
 
==GaN Etching (RIE 5)==
 
==GaN Etching (RIE 5)==
*[[media:08-Plasma Etching of GaN-RIE5.pdf|GaN Etch Recipes - Cl<sub>2</sub>-BCl<sub>3</sub>-Ar]]
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*[//wiki.nanotech.ucsb.edu/w/images/c/cb/08-Plasma_Etching_of_GaN-RIE5.pdf GaN Etch Recipes - Cl<sub>2</sub>-BCl<sub>3</sub>-Ar]
   
== Photoresist and ARC ==
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== Photoresist and ARC (RIE 5) ==
   
 
=== DUV42P (AR2) etching: ===
 
=== DUV42P (AR2) etching: ===

Revision as of 10:01, 14 June 2021