Difference between revisions of "RIE Etching Recipes"

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(→‎RIE 5 (PlasmaTherm): added Photoressit & ARC etching, copied from DUV Litho recipes page)
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=[[RIE 2 (MRC)]] =
 
=[[RIE 2 (MRC)]] =
 
==CdZnTe Etching (RIE 2)==
 
==CdZnTe Etching (RIE 2)==
*[[media:11-CZT_etching-1.pdf|CdZnTe Etch Recipes - CH<sub>4</sub>-H<sub>2</sub>-Ar]]
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*[[media:11-CZT etching-1.pdf|CdZnTe Etch Recipes - CH<sub>4</sub>-H<sub>2</sub>-Ar]]
  
 
==ZnS Etching (RIE 2)==
 
==ZnS Etching (RIE 2)==
*[[media:ZnS_Plasma_Etch-1.pdf|ZnS Etch Recipe - CH<sub>4</sub>-H<sub>2</sub>-Ar]]
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*[[media:ZnS Plasma Etch-1.pdf|ZnS Etch Recipe - CH<sub>4</sub>-H<sub>2</sub>-Ar]]
  
 
==ITO Etching (RIE 2)==
 
==ITO Etching (RIE 2)==
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=[[RIE 5 (PlasmaTherm)]] =
 
=[[RIE 5 (PlasmaTherm)]] =
 
==AlGaAs\GaAs Etching (RIE 5)==
 
==AlGaAs\GaAs Etching (RIE 5)==
*[[media:13-GaAs-AlGaAs_Etching-RIE-5.pdf|GaAs\AlGaAs Etch Recipes - BCl<sub>3</sub>-SiCl<sub>4</sub>]]
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*[[media:13-GaAs-AlGaAs Etching-RIE-5.pdf|GaAs\AlGaAs Etch Recipes - BCl<sub>3</sub>-SiCl<sub>4</sub>]]
  
 
==GaN Etching (RIE 5)==
 
==GaN Etching (RIE 5)==
*[[media:08-Plasma_Etching_of_GaN-RIE5.pdf|GaN Etch Recipes - Cl<sub>2</sub>-BCl<sub>3</sub>-Ar]]
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*[[media:08-Plasma Etching of GaN-RIE5.pdf|GaN Etch Recipes - Cl<sub>2</sub>-BCl<sub>3</sub>-Ar]]
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== Photoresist and ARC ==
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=== DUV42P (AR2) etching: ===
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* O2 = 20sccm // Pressure = 10mT // RF = 100W // Time = 40 sec
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* No need to pump/purge, can etch right away.
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* No helium cooling, Run in manual mode.

Revision as of 17:12, 28 September 2018