RIE Etching Recipes

Back to Dry Etching Recipes.

RIE 2 (MRC)

CdZnTe Etching (RIE 2)

• CdZnTe Etch Recipes - CH₄-H₂-Ar

ZnS Etching (RIE 2)

• ZnS Etch Recipe - CH₄-H₂-Ar

ITO Etching (RIE 2)

• ITO Etch Recipes - CH₄-H₂-Ar

InP-InGaAsP-InGaAlAs Etching (RIE 2)

• InP-InGaAsP-InAlGaAs Etch Recipes - CH₄-H₂-Ar

RIE 3 (MRC)

SiO₂ Etching (RIE 3)

• SiO₂ Etch Recipe with a very low surface damage - CHF₃

SiN_x Etching (RIE 3)

• SiN_x Etch Recipe with a very low surface damage - CHF₃

RIE 5 (PlasmaTherm)

AlGaAs\GaAs Etching (RIE 5)

• GaAs\AlGaAs Etch Recipes - BCl₃-SiCl₄

GaN Etching (RIE 5)

• GaN Etch Recipes - Cl₂-BCl₃-Ar

Photoresist and ARC

DUV42P (AR2) etching:

• O2 = 20sccm // Pressure = 10mT // RF = 100W // Time = 40 sec
• No need to pump/purge, can etch right away.
• No helium cooling, Run in manual mode.