https://wiki.nanofab.ucsb.edu/w/index.php?title=Photolithography_-_Improving_Adhesion_Photoresist_Adhesion&feed=atom&action=history
Photolithography - Improving Adhesion Photoresist Adhesion - Revision history
2024-03-28T09:08:00Z
Revision history for this page on the wiki
MediaWiki 1.35.13
https://wiki.nanofab.ucsb.edu/w/index.php?title=Photolithography_-_Improving_Adhesion_Photoresist_Adhesion&diff=161847&oldid=prev
John d: /* HMDS Process for PR Improving Adhesion */ dehydration/O2 pasma midifcation
2024-02-10T19:41:36Z
<p><span dir="auto"><span class="autocomment">HMDS Process for PR Improving Adhesion: </span> dehydration/O2 pasma midifcation</span></p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 19:41, 10 February 2024</td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>This process tends to improve adhesion between the substrate and subsequent photoresist layers. Use this procedure if you are finding poor adhesion (resist delaminating during develop etc.), or for chemicals (like BHF) that attack the PR adhesion interface strongly.</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>This process tends to improve adhesion between the substrate and subsequent photoresist layers. Use this procedure if you are finding poor adhesion (resist delaminating during develop etc.), or for chemicals (like BHF) that attack the PR adhesion interface strongly.</div></td>
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<td class="diff-marker"> </td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*150°C bake ~2min (Dehydration step)</div></td>
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<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*O2 plasma ([[Ashers (Technics PEII)|PEii Technics]]), 10sec</div></td>
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<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**Optionally could instead do Dehydration of: O2 plasma ([[Ashers (Technics PEII)|PEii Technics]]), 10sec; however this could create more surface SiO2 on silicon. </div></td>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>**This takes the place of the dehydration bake.</div></td>
<td colspan="2" class="diff-empty"> </td>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*''No bake''</div></td>
<td colspan="2" class="diff-empty"> </td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*HMDS application & soak 40s</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>*HMDS application & soak 40s</div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>**Do this with sample loaded on the PR spinner.</div></td>
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<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>**Do this with sample loaded on the PR spinner.</div></td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=Photolithography_-_Improving_Adhesion_Photoresist_Adhesion&diff=159457&oldid=prev
John d: mentioned lift-off delam
2021-11-24T18:27:15Z
<p>mentioned lift-off delam</p>
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<td colspan="2" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 18:27, 24 November 2021</td>
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<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>Don't forget that, for [[Lithography Recipes#Lift-Off Recipes|lift-off processes]], the Imaging (top) Photoresist will lift-off as well if you undercut it too much during develop!</div></td>
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<td class="diff-marker"><a class="mw-diff-movedpara-left" title="Paragraph was moved. Click to jump to new location." href="#movedpara_2_1_rhs">⚫</a></td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div><a name="movedpara_1_0_lhs"></a>==<del class="diffchange diffchange-inline"> </del>Underlayers for improving PR adhesion<del class="diffchange diffchange-inline"> </del>==</div></td>
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<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"></td>
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<td class="diff-marker"><a class="mw-diff-movedpara-right" title="Paragraph was moved. Click to jump to old location." href="#movedpara_1_0_lhs">⚫</a></td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div><a name="movedpara_2_1_rhs"></a>==Underlayers for improving PR adhesion==</div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>High-temperature (>150°C) underlayers, such as LOL1000/2000, BARC layers tend to improve adhesion of the imaging resist.</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>High-temperature (>150°C) underlayers, such as LOL1000/2000, BARC layers tend to improve adhesion of the imaging resist.</div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>Substrate prep: O2 plasma ([[Ashers (Technics PEII)|PEii Technics]]), 10sec</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Substrate prep: O2 plasma ([[Ashers (Technics PEII)|PEii Technics]]), 10sec</div></td>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>Apply high-temp underlayer, eg. LOL1000/2000, PMGI, DSK101 (DUV), DSK42P (DUV)</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Apply high-temp underlayer, eg. LOL1000/2000, PMGI, DSK101 (DUV), DSK42P (DUV)</div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>**<del class="diffchange diffchange-inline"> </del>Beware of underlayers that have a develop-rate - undercutting the imaging PR fully can also cause delamination)</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**Beware of underlayers that have a develop-rate - undercutting the imaging PR fully can also cause delamination)</div></td>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>Apply your Imaging photoresist as normal.</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Apply your Imaging photoresist as normal.</div></td>
</tr>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
</tr>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>==<del class="diffchange diffchange-inline"> </del>HMDS Process for PR Improving Adhesion<del class="diffchange diffchange-inline"> </del>==</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>==HMDS Process for PR Improving Adhesion==</div></td>
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<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>This process tends to improve adhesion between the substrate and subsequent photoresist layers. Use this procedure if you are finding poor adhesion (resist delaminating during develop etc.), or for chemicals (like BHF) that attack the PR adhesion interface strongly.</div></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"><div>This process tends to improve adhesion between the substrate and subsequent photoresist layers. Use this procedure if you are finding poor adhesion (resist delaminating during develop etc.), or for chemicals (like BHF) that attack the PR adhesion interface strongly.</div></td>
</tr>
<tr>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
<td class="diff-marker"> </td>
<td style="background-color: #f8f9fa; color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #eaecf0; vertical-align: top; white-space: pre-wrap;"></td>
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<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>O2 plasma ([[Ashers (Technics PEII)|PEii Technics]]), 10sec</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*O2 plasma ([[Ashers (Technics PEII)|PEii Technics]]), 10sec</div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>**<del class="diffchange diffchange-inline"> </del>This takes the place of the dehydration bake.<del class="diffchange diffchange-inline"> </del></div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**This takes the place of the dehydration bake.</div></td>
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<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>''No bake''</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*''No bake''</div></td>
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<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>HMDS application & soak 40s</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*HMDS application & soak 40s</div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>**<del class="diffchange diffchange-inline"> </del>Do this with sample loaded on the PR spinner.</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>**Do this with sample loaded on the PR spinner.</div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>Spin-dry - any spin speed, ~15-30sec</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Spin-dry - any spin speed, ~15-30sec</div></td>
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<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>HMDS bake at 100-110°C for 90s. </div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*HMDS bake at 100-110°C for 90s. </div></td>
</tr>
<tr>
<td class="diff-marker">−</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #ffe49c; vertical-align: top; white-space: pre-wrap;"><div>*<del class="diffchange diffchange-inline"> </del>Then your normal PR process on top.</div></td>
<td class="diff-marker">+</td>
<td style="color: #202122; font-size: 88%; border-style: solid; border-width: 1px 1px 1px 4px; border-radius: 0.33em; border-color: #a3d3ff; vertical-align: top; white-space: pre-wrap;"><div>*Then your normal PR process on top.</div></td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=Photolithography_-_Improving_Adhesion_Photoresist_Adhesion&diff=159452&oldid=prev
John d: John d moved page Photolithography - HMDS Process for Improving Adhesion to Photolithography - Improving Adhesion Photoresist Adhesion without leaving a redirect: more generalized page title
2021-11-24T18:12:13Z
<p>John d moved page <a href="/w/index.php?title=Photolithography_-_HMDS_Process_for_Improving_Adhesion&action=edit&redlink=1" class="new" title="Photolithography - HMDS Process for Improving Adhesion (page does not exist)">Photolithography - HMDS Process for Improving Adhesion</a> to <a href="/wiki/Photolithography_-_Improving_Adhesion_Photoresist_Adhesion" title="Photolithography - Improving Adhesion Photoresist Adhesion">Photolithography - Improving Adhesion Photoresist Adhesion</a> without leaving a redirect: more generalized page title</p>
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<td colspan="1" style="background-color: #fff; color: #202122; text-align: center;">← Older revision</td>
<td colspan="1" style="background-color: #fff; color: #202122; text-align: center;">Revision as of 18:12, 24 November 2021</td>
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John d
https://wiki.nanofab.ucsb.edu/w/index.php?title=Photolithography_-_Improving_Adhesion_Photoresist_Adhesion&diff=159451&oldid=prev
John d: added Underlayers for PR adhesion
2021-11-24T18:11:24Z
<p>added Underlayers for PR adhesion</p>
<p><b>New page</b></p><div>== Underlayers for improving PR adhesion ==<br />
High-temperature (>150°C) underlayers, such as LOL1000/2000, BARC layers tend to improve adhesion of the imaging resist.<br />
<br />
* Substrate prep: O2 plasma ([[Ashers (Technics PEII)|PEii Technics]]), 10sec<br />
* Apply high-temp underlayer, eg. LOL1000/2000, PMGI, DSK101 (DUV), DSK42P (DUV)<br />
** Beware of underlayers that have a develop-rate - undercutting the imaging PR fully can also cause delamination)<br />
* Apply your Imaging photoresist as normal.<br />
<br />
== HMDS Process for PR Improving Adhesion ==<br />
This process tends to improve adhesion between the substrate and subsequent photoresist layers. Use this procedure if you are finding poor adhesion (resist delaminating during develop etc.), or for chemicals (like BHF) that attack the PR adhesion interface strongly.<br />
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* O2 plasma ([[Ashers (Technics PEII)|PEii Technics]]), 10sec<br />
** This takes the place of the dehydration bake. <br />
* ''No bake''<br />
* HMDS application & soak 40s<br />
** Do this with sample loaded on the PR spinner.<br />
* Spin-dry - any spin speed, ~15-30sec<br />
* HMDS bake at 100-110°C for 90s. <br />
* Then your normal PR process on top.</div>
John d