Difference between revisions of "PECVD Recipes"

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=[[ICP-PECVD (Unaxis VLR)]]=
 
=[[ICP-PECVD (Unaxis VLR)]]=
 +
 
*[https://docs.google.com/spreadsheets/d/1Q857p-lMQn3yq-rftHptaPShYZaZxolrY0YuDDadYxo/edit#gid=sharing Particles in Unaxis films @100C-2019]
 
*[https://docs.google.com/spreadsheets/d/1Q857p-lMQn3yq-rftHptaPShYZaZxolrY0YuDDadYxo/edit#gid=sharing Particles in Unaxis films @100C-2019]
  
 
==SiN deposition (Unaxis VLR)==
 
==SiN deposition (Unaxis VLR)==
*[https://drive.google.com/drive/folders/1krAPFz2wthdfXa-S7g1FhA23PtSgKEi3= SiN 100C Table-2019]
+
[[SiN 100C Table-2019]]
 +
 
 
*[https://docs.google.com/spreadsheets/d/1hlNqtvKXKCD6aI8tnMx9dMTTiANM3pK7U9dtCtnDh-0/edit#gid=sharing SiN 100C 300nm Data-2019]
 
*[https://docs.google.com/spreadsheets/d/1hlNqtvKXKCD6aI8tnMx9dMTTiANM3pK7U9dtCtnDh-0/edit#gid=sharing SiN 100C 300nm Data-2019]
 
*[https://docs.google.com/spreadsheets/d/1uIhx-TD11lDSjpCyPtgKC_CmuNWKLx6iLl5PJgVDt30/edit#gid=sharing Thickness Uniformity SiN 100C 300nm-2019]
 
*[https://docs.google.com/spreadsheets/d/1uIhx-TD11lDSjpCyPtgKC_CmuNWKLx6iLl5PJgVDt30/edit#gid=sharing Thickness Uniformity SiN 100C 300nm-2019]
  
==SiO2 deposition (Unaxis VLR) ==
+
==SiO2 deposition (Unaxis VLR)==
 +
 
 
*[https://docs.google.com/spreadsheets/d/1UXjhMJGOYDNJUOkgAoDUbfbAOjmQp163JLs5FvgNevM/edit#gid=sharing SiO2 LDR 100C 300nm Data-2019]
 
*[https://docs.google.com/spreadsheets/d/1UXjhMJGOYDNJUOkgAoDUbfbAOjmQp163JLs5FvgNevM/edit#gid=sharing SiO2 LDR 100C 300nm Data-2019]
 
*[https://docs.google.com/spreadsheets/d/1ZAdNJH_N4FUuBQphB0qVnKHCM8Nwzv9tP32eDj-MIyE/edit#gid=sharing SiO2 HDR 100C 300nm Data-2019]
 
*[https://docs.google.com/spreadsheets/d/1ZAdNJH_N4FUuBQphB0qVnKHCM8Nwzv9tP32eDj-MIyE/edit#gid=sharing SiO2 HDR 100C 300nm Data-2019]
 
*[https://docs.google.com/spreadsheets/d/1tRuq4afSwd5DnhAnzIBvnrCy_n0v3q3IDa78bxCEeFI/edit#gid=sharing Thickness Uniformity SiO2 LDR 100C 300nm-2019]
 
*[https://docs.google.com/spreadsheets/d/1tRuq4afSwd5DnhAnzIBvnrCy_n0v3q3IDa78bxCEeFI/edit#gid=sharing Thickness Uniformity SiO2 LDR 100C 300nm-2019]
 
*[https://docs.google.com/spreadsheets/d/1y4mpR4i0gbzSNRbSYGASVSms36FuPh-jDnS3v82OEII/edit#gid=sharing Thickness Uniformity SiO2 HDR 100C 300nm-2019]
 
*[https://docs.google.com/spreadsheets/d/1y4mpR4i0gbzSNRbSYGASVSms36FuPh-jDnS3v82OEII/edit#gid=sharing Thickness Uniformity SiO2 HDR 100C 300nm-2019]

Revision as of 06:35, 3 October 2019

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

Note: Software upgrade performed on 2018-10-10. Note any changes in film.


SiN deposition (PECVD #1)


SiO2 deposition (PECVD #1)


OTHER recipes: Low-Stress (LS) SiN and SiOxNy deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO2 deposition (PECVD #2)


SiN deposition (PECVD #2)



Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)


Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN 100C Table-2019

SiO2 deposition (Unaxis VLR)