Difference between revisions of "PECVD Recipes"

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=[[ICP-PECVD (Unaxis VLR)]]=
 
=[[ICP-PECVD (Unaxis VLR)]]=
 
==SiN deposition (Unaxis VLR)==
 
==SiN deposition (Unaxis VLR)==
[[Unaxis SiN100C 300nm-2019]]
+
 
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*[https://docs.google.com/spreadsheets/d/1hlNqtvKXKCD6aI8tnMx9dMTTiANM3pK7U9dtCtnDh-0/edit#gid=sharing Unaxis SiN100C 300nm-2019]
 
*[https://docs.google.com/spreadsheets/d/1hlNqtvKXKCD6aI8tnMx9dMTTiANM3pK7U9dtCtnDh-0/edit#gid=sharing Unaxis SiN100C 300nm-2019]
  
 
==SiO2 deposition (Unaxis VLR)==
 
==SiO2 deposition (Unaxis VLR)==
 
<br />
 
<br />

Revision as of 07:40, 10 September 2019

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

Note: Software upgrade performed on 2018-10-10. Note any changes in film.


SiN deposition (PECVD #1)


SiO2 deposition (PECVD #1)


OTHER recipes: Low-Stress (LS) SiN and SiOxNy deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO2 deposition (PECVD #2)


SiN deposition (PECVD #2)



Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)


Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiO2 deposition (Unaxis VLR)