Revision as of 10:48, 12 October 2018

PECVD 1 (PlasmaTherm 790)

Note: Software upgrade performed on 2018-10-10. Note any changes in film.

SiN deposition (PECVD #1)

SiO₂ deposition (PECVD #1)

OTHER recipes: Low-Stress (LS) SiN and SiO_xN_y deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO₂ deposition (PECVD #2)

SiN deposition (PECVD #2)

Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)

Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH₄)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe (5W 50° High Stress) SiN Deposition Recipe (50W 50° Medium Stress) SiN Deposition Recipe (120W 50° Low Stress)	SiN Deposition Recipe (5W 100° High Stress) SiN Deposition Recipe (50W 100° Medium Stress) SiN Deposition Recipe (120W 100° Low Stress) Comparison Table SiNx (120W 100° Low Stress) Comparison Table SiNx (50W 100° Medium Stress) Comparison Table SiNx (5W 100° High Stress) SiNx SEM images (50W 100° Medium Stress) SiNx SEM images (5W 100° High Stress)	SiN Deposition Recipe (5W 250° High Stress) SiN Deposition Recipe (50W 250° Medium Stress) SiN Deposition Recipe (120W 250° Low Stress) Comparison Table SiNx (120W 250° Low Stress) Comparison Table SiNx (50W 250° Medium Stress) Comparison Table SiNx (5W 250° High Stress) Very-Low-Pin-Hole-Density SiNx Recipe(25W 300°)

SiN (2% SiH₄ - No-Ar)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe - No Ar (5W 50° High Stress) Film Properties of High-stress SiN_x (No Ar, 5W, 50°) SiN Deposition Recipe - No Ar (50W 50° Medium Stress) Film Properties of Medium-stress SiN_x (No Ar, 50W, 50°) SiN Deposition Recipe - No Ar (120W 50° Low Stress) Film Properties of Low-stress SiN_x (No Ar, 120W, 50°)	SiN Deposition Recipe - No Ar (5W 100° High Stress) Film Properties of high-stress SiN_x (No Ar, 5W, 100°) SiN Deposition Recipe - No Ar (50W 100° Medium Stress) Film Properties of Medium-stress SiN_x (No Ar, 50W, 100°) SiN Deposition Recipe - No Ar (120W 100° Low Stress) Film Properties of Low-stress SiN_x (No Ar, 120W, 100°)	SiN Deposition Recipe - No Ar (5W 250° High Stress) Film Properties of High-stress SiN_x (No Ar, 5W, 250°) SiN Deposition Recipe - No Ar (50W 250° Medium Stress) Film Properties of Medium-stress SiN_x (No Ar, 50W, 250°) SiN Deposition Recipe - No Ar (120W 250° Low Stress) Film Properties of Low-stress SiN_x (No Ar, 120W, 250°)

SiN (2% SiH₄ - No-Ar - Extra N₂)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe - No Ar Extra N₂ (120W 50° Low Stress)	SiN Deposition Recipe - No Ar Extra N₂ (120W 100° Low Stress)	SiN Deposition Recipe - No Ar Extra N₂ (120W 250° Low Stress)

SiN (100% SiH₄ )

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe (120W 50° Low Stress)	SiN Deposition Recipe (120W 100° Low Stress) SiN Comparison Table 120W-100(250)C	SiN Deposition Recipe (120W 250° Low Stress) SiN Comparison Table 120W, 100(250)C
SiN Deposition Recipe (50W 50° Medium Stress)	SiN Deposition Recipe (50W 100° Medium Stress) SiN Comparison Table 50W, 100(250)C SiN SEM sidewall coverage	SiN Deposition Recipe (50W 250° Medium Stress) SiN ComparisonTable 50W, 100(250)C

SiO₂ deposition (Unaxis VLR)

SiO₂ (2% SiH₄)

50°	100°	250°
SiO₂ Deposition Recipe (5W 50°)	SiO₂ Deposition Recipe (5W 100°) SiO₂ film Unaxis ICP vs PECVD I SiO₂ SEM pictures 100C	SiO₂ Deposition Recipe (5W 250°) SiO₂ film Unaxis ICP vs PECVD I

SiO₂ (2% SiH₄ - No Ar)

50°	100°	250°
SiO₂ Deposition Recipe - No Ar (50°) SiO₂ Film Properties-No Ar	SiO₂ Deposition Recipe - No Ar (100°) SiO₂ Film Properties-No Ar	SiO₂ Deposition Recipe - No Ar (250°) SiO₂ Film Properties-No Ar

SiO₂ (100% SiH₄ HDR)

50°	100°	250°
SiO₂ Deposition Recipe - HDR (50°)	SiO₂ Deposition Recipe - HDR (100°) SiO₂ Comparison Table - HDR (100°)	SiO₂ Deposition Recipe - HDR (250°) SiO₂ Comparison Table - HDR (250°)

SiO₂ (100% SiH₄ LDR)

50°	100°	250°
SiO₂ Deposition Recipe - LDR (50°)	SiO₂ Deposition Recipe - LDR (100°) SiO₂ Comparison Table - LDR (100°) SiO₂ SEM sidewall coverage	SiO₂ Deposition Recipe - LDR (250°) SiO₂ Comparison Table - LDR (250°)

Amorphous Si (100%SiH₄ Ar He)

90°	250°
a-Si Deposition Recipe - 90°	a-Si Deposition Recipe - 250° Thick, Defects-free a-Si Film on SiO₂/Si with a Lower Bias Power

@@ Line 1: / Line 1: @@
 {{recipes|Vacuum Deposition}}
 =[[PECVD 1 (PlasmaTherm 790)]]=
+ Note: Software upgrade performed on 2018-10-10. Note any changes in film.
 *[https://docs.google.com/spreadsheets/d/1a0XrY6HuJ6L9niThZYI-u4XH69Hnbe3jkm1qKmrR8Rg/edit#gid=sharing Particulates (Gain4) in PECVD#1 2015]
 *[https://docs.google.com/spreadsheets/d/1ZfkspbCQZmdThC8qB4XyjsyPAzrMF1QbHSMFmH6xSo4/edit#gid=sharing Particulates (Gain4) in PECVD#1 2016]
@@ Line 114: / Line 115: @@
 ==SiN deposition (Unaxis VLR) ==
 === SiN (2% SiH<sub>4</sub>)   ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |50° (pinholes)
@@ Line 145: / Line 146: @@
 === SiN  (2% SiH<sub>4</sub> - No-Ar)  ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |50° (pinholes)
@@ Line 176: / Line 177: @@
 === SiN  (2% SiH<sub>4</sub> - No-Ar - Extra N<sub>2</sub>)  ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |50° (pinholes)
@@ Line 192: / Line 193: @@
 === SiN  (100% SiH<sub>4</sub> ) ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |50° (pinholes)
@@ Line 221: / Line 222: @@
 ==SiO<sub>2</sub> deposition (Unaxis VLR) ==
 === SiO<sub>2</sub> (2% SiH<sub>4</sub>)   ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |50°
@@ Line 240: / Line 241: @@
 === SiO<sub>2</sub> (2% SiH<sub>4</sub> - No Ar)   ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |50°
@@ Line 259: / Line 260: @@
 === SiO<sub>2</sub> (100% SiH<sub>4</sub> HDR)   ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |50°
@@ Line 277: / Line 278: @@
 === SiO<sub>2</sub> (100% SiH<sub>4</sub> LDR)   ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |50°
@@ Line 296: / Line 297: @@
 === Amorphous Si (100%SiH<sub>4</sub> Ar He)   ===
-{| class="wikitable" border="1" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;"
+{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
 |- bgcolor="#D0E7FF"
 ! width="350" align="center" |90°

Difference between revisions of "PECVD Recipes"

Revision as of 10:48, 12 October 2018

Contents

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

SiO₂ deposition (PECVD #1)

OTHER recipes: Low-Stress (LS) SiN and SiO_xN_y deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO₂ deposition (PECVD #2)

SiN deposition (PECVD #2)

Low-Stress SiN deposition (PECVD #2)

Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH₄)

SiN (2% SiH₄ - No-Ar)

SiN (2% SiH₄ - No-Ar - Extra N₂)

SiN (100% SiH₄ )

SiO₂ deposition (Unaxis VLR)

SiO₂ (2% SiH₄)

SiO₂ (2% SiH₄ - No Ar)

SiO₂ (100% SiH₄ HDR)

SiO₂ (100% SiH₄ LDR)

Amorphous Si (100%SiH₄ Ar He)

Navigation menu

Search

Difference between revisions of "PECVD Recipes"

Revision as of 10:48, 12 October 2018

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

SiO2 deposition (PECVD #1)

OTHER recipes: Low-Stress (LS) SiN and SiOxNy deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO2 deposition (PECVD #2)

SiN deposition (PECVD #2)

Low-Stress SiN deposition (PECVD #2)

Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH4)

SiN (2% SiH4 - No-Ar)

SiN (2% SiH4 - No-Ar - Extra N2)

SiN (100% SiH4 )

SiO2 deposition (Unaxis VLR)

SiO2 (2% SiH4)

SiO2 (2% SiH4 - No Ar)

SiO2 (100% SiH4 HDR)

SiO2 (100% SiH4 LDR)

Amorphous Si (100%SiH4 Ar He)

Navigation menu

Search

SiO₂ deposition (PECVD #1)

OTHER recipes: Low-Stress (LS) SiN and SiO_xN_y deposition (PECVD #1)

SiO₂ deposition (PECVD #2)

SiN (2% SiH₄)

SiN (2% SiH₄ - No-Ar)

SiN (2% SiH₄ - No-Ar - Extra N₂)

SiN (100% SiH₄ )

SiO₂ deposition (Unaxis VLR)

SiO₂ (2% SiH₄)

SiO₂ (2% SiH₄ - No Ar)

SiO₂ (100% SiH₄ HDR)

SiO₂ (100% SiH₄ LDR)

Amorphous Si (100%SiH₄ Ar He)