Difference between revisions of "PECVD Recipes"

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*[[Media:PECVD2-SiO2-Recipe-5W-50C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 50°)]]
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*[[Media:PECVD2-SiO2Recipe-5W-50C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 50°)]]
 
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*[[Media:PECVD2-SiO2-Recipe-5W-100C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 100°)]]
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*[[Media:PECVD2-SiO2Recipe-5W-100C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 100°)]]
 
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*[[Media:PECVD2-SiO2-Recipe-5W-250C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 250°)]]
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*[[Media:PECVD2-SiO2Recipe-5W-250C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 250°)]]
 
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Revision as of 15:51, 10 October 2012

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

SiO2 deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiN deposition (PECVD #2)

SiO2 deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH4)

50° 100° 250°

SiN (2% SiH4 - No-Ar)

50° 100° 250°

SiN (2% SiH4 - No-Ar - Extra N2)

50° 100° 250°

SiN (100% SiH4 )

50° 100° 250°

SiO2 deposition (Unaxis VLR)

SiO2 (2% SiH4)

50° 100° 250°

SiO2 (2% SiH4 - No Ar)

50° 100° 250°

SiO2 (100% SiH4 HDR)

50° 100° 250°

SiO2 (100% SiH4 LDR)

50° 100° 250°