Difference between revisions of "PECVD Recipes"
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*[[Media:PECVD2-SiO2-Recipe-NoAr-250C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (250°)]] |
*[[Media:PECVD2-SiO2-Recipe-NoAr-250C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (250°)]] |
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+ | |- |
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+ | |} |
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+ | === SiO<sub>2</sub> (100% SiH<sub>4</sub> HDR) === |
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+ | {| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" |
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+ | |- bgcolor="#D0E7FF" |
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+ | !width=350 align=center|50° |
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+ | !width=350 align=center|100° |
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+ | !width=350 align=center|250° |
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+ | |-align=left |
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+ | | |
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+ | *[[Media:PECVD2-SiO2-Recipe-100%SiH4-HDR-50C.pdf|SiO<sub>2</sub> Deposition Recipe - HDR (50°)]] |
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+ | | |
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+ | *[[Media:PECVD2-SiO2-Recipe-100%SiH4-HDR-100C.pdf|SiO<sub>2</sub> Deposition Recipe - HDR (100°)]] |
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+ | | |
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+ | *[[Media:PECVD2-SiO2-Recipe-100%SiH4-HDR-250C.pdf|SiO<sub>2</sub> Deposition Recipe - HDR (250°)]] |
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+ | |- |
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+ | |} |
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+ | === SiO<sub>2</sub> (100% SiH<sub>4</sub> LDR) === |
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+ | {| border="1" class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" |
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+ | |- bgcolor="#D0E7FF" |
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+ | !width=350 align=center|50° |
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+ | !width=350 align=center|100° |
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+ | !width=350 align=center|250° |
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+ | |-align=left |
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+ | | |
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+ | *[[Media:PECVD2-SiO2-Recipe-100%SiH4-LDR-50C.pdf|SiO<sub>2</sub> Deposition Recipe - LDR (50°)]] |
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+ | | |
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+ | *[[Media:PECVD2-SiO2-Recipe-100%SiH4-LDR-100C.pdf|SiO<sub>2</sub> Deposition Recipe - LDR (100°)]] |
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+ | | |
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+ | *[[Media:PECVD2-SiO2-Recipe-100%SiH4-LDR-250C.pdf|SiO<sub>2</sub> Deposition Recipe - LDR (250°)]] |
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Revision as of 11:22, 20 August 2012
Back to Vacuum Deposition Recipes.
PECVD 1 (PlasmaTherm 790)
SiN deposition (PECVD #1)
SiO2 deposition (PECVD #1)
PECVD 2 (Advanced Vacuum)
SiN deposition (PECVD #2)
SiO2 deposition (PECVD #2)
ICP-PECVD (Unaxis VLR)
SiN deposition (Unaxis VLR)
SiN (2% SiH4)
50° | 100° | 250° |
---|---|---|
SiN (2% SiH4 - No-Ar)
50° | 100° | 250° |
---|---|---|
SiN (2% SiH4 - No-Ar - Extra N2)
50° | 100° | 250° |
---|---|---|
SiO2 deposition (Unaxis VLR)
SiO2 (2% SiH4)
50° | 100° | 250° |
---|---|---|
SiO2 (2% SiH4 - No Ar)
50° | 100° | 250° |
---|---|---|
SiO2 (100% SiH4 HDR)
50° | 100° | 250° |
---|---|---|
SiO2 (100% SiH4 LDR)
50° | 100° | 250° |
---|---|---|