Difference between revisions of "PECVD Recipes"

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=== Standard Recipe ===
 
=== Standard Recipe ===
  
====2019 Data SiO2 100C====
 
 
*[https://docs.google.com/spreadsheets/d/1sk_3Gn9yTOsgpFPTYv1MF0lGo3xHqNM-MQ2Kd4beu10/edit#gid=sharing SiO2 LDR 100C Table-2019]
 
*[https://docs.google.com/spreadsheets/d/1sk_3Gn9yTOsgpFPTYv1MF0lGo3xHqNM-MQ2Kd4beu10/edit#gid=sharing SiO2 LDR 100C Table-2019]
 
*[https://docs.google.com/spreadsheets/d/1vYAFwFCWE-bH7iZXXazFyY56vjCcTMIx9fcRJNO115s/edit#gid=sharing SiO2 HDR 100C Table-2019]
 
*[https://docs.google.com/spreadsheets/d/1vYAFwFCWE-bH7iZXXazFyY56vjCcTMIx9fcRJNO115s/edit#gid=sharing SiO2 HDR 100C Table-2019]

Revision as of 14:49, 30 March 2020

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

Historical Particulate Data

SiN deposition (PECVD #1)

Historical Data

Thin-Film Properties
Uniformity Data

SiO2 deposition (PECVD #1)

Historical Data

Thin-Film Properties

Uniformity Data

Low-Stress SiN - LS-SiN (PECVD#1)

SiOxNy deposition (PECVD #1)

Cleaning Recipes (PECVD #1)

To Be Added...

PECVD 2 (Advanced Vacuum)

Historical Particulate Data

SiO2 deposition (PECVD #2)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

SiN deposition (PECVD #2)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

Amorphous-Si deposition (PECVD #2)

Cleaning Recipes (PECVD #2)

To Be Added...

ICP-PECVD (Unaxis VLR)

Historical Particulate Data

SiN deposition (Unaxis VLR)

The recipe SiN 100C is not valid currently, and is still under development. 
-- Demis 2019-11-22

2020 Data SiN 250C

2020 Data SiN LS 250C

SiO2 deposition (Unaxis VLR)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

2019 Data SiO2 250 C

Historical Data

Thin-Film Properties

Uniformity Data

2020 Data SiO2 250C

Cleaning Recipes (Unaxis VLR Dep)

You must edit the Post-Dep Clean recipe to correspond to your deposited thickness and material. See the Operating Procedure on the Unaxis Tool Page for details.

  • SiNx etches at 20nm/min
  • SiO2 etches at 40nm/min