Difference between revisions of "PECVD Recipes"

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==SiO2 deposition (Unaxis VLR)==
 
==SiO2 deposition (Unaxis VLR)==
Standard Recipe  
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 +
=== Standard Recipe ===
  
 
=== '''2019 Data SiO2 100C''' ===
 
=== '''2019 Data SiO2 100C''' ===
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*[https://docs.google.com/spreadsheets/d/1vYAFwFCWE-bH7iZXXazFyY56vjCcTMIx9fcRJNO115s/edit#gid=sharing SiO2 HDR 100C Table-2019]
 
*[https://docs.google.com/spreadsheets/d/1vYAFwFCWE-bH7iZXXazFyY56vjCcTMIx9fcRJNO115s/edit#gid=sharing SiO2 HDR 100C Table-2019]
 
*[https://docs.google.com/spreadsheets/d/1y4mpR4i0gbzSNRbSYGASVSms36FuPh-jDnS3v82OEII/edit#gid=sharing Thickness Uniformity SiO2 HDR 100C 300nm-2019]
 
*[https://docs.google.com/spreadsheets/d/1y4mpR4i0gbzSNRbSYGASVSms36FuPh-jDnS3v82OEII/edit#gid=sharing Thickness Uniformity SiO2 HDR 100C 300nm-2019]
Historical Data
 
  
Thin-Film Properties
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=== Historical Data ===
 +
 
 +
=== Thin-Film Properties ===
  
Uniformity Data  
+
=== Uniformity Data ===
  
 
=== '''2019 Data SiO2 250C''' ===
 
=== '''2019 Data SiO2 250C''' ===

Revision as of 14:16, 30 March 2020

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

Historical Particulate Data

SiN deposition (PECVD #1)

Historical Data

Thin-Film Properties
Uniformity Data

SiO2 deposition (PECVD #1)

Historical Data

Thin-Film Properties

Uniformity Data

Low-Stress SiN - LS-SiN (PECVD#1)

SiOxNy deposition (PECVD #1)

Cleaning Recipes (PECVD #1)

To Be Added...

PECVD 2 (Advanced Vacuum)

Historical Particulate Data

SiO2 deposition (PECVD #2)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

SiN deposition (PECVD #2)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)

Standard Recipe

Historical Data

Thin-Film Properties
Uniformity Data

Amorphous-Si deposition (PECVD #2)

Cleaning Recipes (PECVD #2)

To Be Added...

ICP-PECVD (Unaxis VLR)

Historical Particulate Data

SiN deposition (Unaxis VLR)

The recipe SiN 100C is not valid currently, and is still under development. 
-- Demis 2019-11-22

2020 Data SiN 250C

2020 Data SiN LS 250C

SiO2 deposition (Unaxis VLR)

Standard Recipe

2019 Data SiO2 100C

Historical Data

Thin-Film Properties

Uniformity Data

2019 Data SiO2 250C

2020 Data SiO2 250C

Cleaning Recipes (Unaxis VLR Dep)

You must edit the Post-Dep Clean recipe to correspond to your deposited thickness and material. See the Operating Procedure on the Unaxis Tool Page for details.

  • SiNx etches at 20nm/min
  • SiO2 etches at 40nm/min