Difference between revisions of "PECVD Recipes"
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*[https://docs.google.com/spreadsheets/d/1kaLSwIAPLVuvhshVoc-JkgaF-gw97baSSJ1obvlsE50/edit#gid=sharing SiN 100C Table-2019] |
*[https://docs.google.com/spreadsheets/d/1kaLSwIAPLVuvhshVoc-JkgaF-gw97baSSJ1obvlsE50/edit#gid=sharing SiN 100C Table-2019] |
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| + | These Si3N4 recipes (2500C) are valid. |
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| − | |||
*[https://docs.google.com/spreadsheets/d/1VrgS0cB2OcdZVTCnDAesgQCLRaAgEB_Iajc_OrhXOo0/edit#gid=sharing SiN 250C 300nm Data-2020] |
*[https://docs.google.com/spreadsheets/d/1VrgS0cB2OcdZVTCnDAesgQCLRaAgEB_Iajc_OrhXOo0/edit#gid=sharing SiN 250C 300nm Data-2020] |
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*[https://docs.google.com/spreadsheets/d/1i2mE2K12EEulnCbO9KuU9PCcvHAmcGxTIXUF8x4IOWk/edit#gid=sharing SiN LS 250C 300nm Data-2020] |
*[https://docs.google.com/spreadsheets/d/1i2mE2K12EEulnCbO9KuU9PCcvHAmcGxTIXUF8x4IOWk/edit#gid=sharing SiN LS 250C 300nm Data-2020] |
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Revision as of 13:57, 25 March 2020
Back to Vacuum Deposition Recipes.
PECVD 1 (PlasmaTherm 790)
Historical Particulate Data
- Particulates(Gain4) in PECVD#1-OLD DATA 2015
- Particulates(Gain4) in PECVD#1-OLD DATA 2016
- Particulates(Gain4) in PECVD#1-OLD DATA 2017
- Particulates in PECVD#1 films 2017
- Particulates in PECVD#1 films 2018
- Particulates in PECVD#1 films 2019
- Particulates in PECVD#1 films 2020
SiN deposition (PECVD #1)
Historical Data
Thin-Film Properties
- SiN 100nm Data 2014
- SiN 100nm Data 2015
- SiN 100nm Data 2016
- SiN 100nm Data 2017
- SiN 300nm Data 2017
- SiN 300nm Data 2018
- SiN 300nm Data 2019
- SiN 300nm Data 2020
Uniformity Data
- SiN 100 nm Thickness uniformity 2014
- SiN 100 nm Thickness uniformity 2015
- SiN 100 nm Thickness uniformity 2016
- SiN 100 nm Thickness uniformity 2017
- SiN 300nm Thickness uniformity 2017
- SiN 300nm Thickness uniformity 2018
- SiN 300nm Thickness uniformity 2019
- SiN 300nm Thickness uniformity 2020
SiO2 deposition (PECVD #1)
Historical Data
Thin-Film Properties
- SiO2 100nm Data 2014
- SiO2 100nm Data 2015
- SiO2 100nm Data 2016
- SiO2 100nm Data 2017
- SiO2 300nm Data 2017
- SiO2 300nm Data 2018
- SiO2 300nm Data 2019
- SiO2 300nm Data 2020
Uniformity Data
- SiO2 100nm Thickness uniformity 2014
- SiO2 100 nm Thickness uniformity 2015
- SiO2 100 nmThickness uniformity 2016
- SiO2 100nm Thickness uniformity 2017
- SiO2 300nm Thickness uniformity 2017
- SiO2 300nm Thickness uniformity 2018
- SiO2 300nm Thickness uniformity 2019
- SiO2 300nm Thickness uniformity 2020
Low-Stress SiN - LS-SiN (PECVD#1)
SiOxNy deposition (PECVD #1)
Cleaning Recipes (PECVD #1)
To Be Added...
PECVD 2 (Advanced Vacuum)
Historical Particulate Data
- Particulates (Gain4) in PECVD#2 2015
- Particulates (Gain4) in PECVD#2 2016
- Particulates (Gain4) in PECVD#2 2017
- Particulates in PECVD#2 films 2017
- Particulates in PECVD#2 films 2018
- Particulates in PECVD#2 films 2019
- Particulates in PECVD#2 films 2020
SiO2 deposition (PECVD #2)
Standard Recipe
Historical Data
Thin-Film Properties
- Oxide Data 2014
- Oxide Data 2015
- Oxide data 2016
- Oxide Data 2017
- Oxide Data 2018
- Oxide Data 2019
- Oxide Data 2020
Uniformity Data
- Oxide Thickness Uniformity 2014
- Oxide Thickness Uniformity 2015
- Oxide Thickness Uniformity 2016
- Oxide Thickness Uniformity 2017
- Oxide Thickness Uniformity 2018
- Oxide Thickness Uniformity 2019
- Oxide Thickness Uniformity 2020
SiN deposition (PECVD #2)
Standard Recipe
- SiNx Film Stress vs LF and HF Duration Time, and Gas Flowing-rate
- Nitride2 Standard Recipe 2014-5/9/2018
- STD Nitride2 Standard Recipe 5/9/2018
- Table STD Nitride2
Historical Data
Thin-Film Properties
- Nitride2 Data 2014
- Nitride2 Data 2015
- Nitride2 Data 2016
- Nitride2 Data 2017
- Nitride2 Data 2018
- Nitride2 Data 2019
- Nitride2 Data 2020
Uniformity Data
- Nitride2 Thickness Uniformity 2014
- Nitride2 Thickness Uniformity 2015
- Nitride2 Thickness Uniformity 2016
- Nitride2 Thickness Uniformity 2017
- Nitride2 Thickness Uniformity 2018
- Nitride2 Thickness Uniformity 2019
- Nitride2 Thickness Uniformity 2020
Low-Stress SiN deposition (PECVD #2)
Low-Stress SilIcon Nitride (< 100 MPa)
Standard Recipe
- STD LSNitride2 12/14/2018
- Table STD LS Nitride2
- Old Versions:
Historical Data
Thin-Film Properties
- LS Nitride2 Data 2014
- LS Nitride2 Data 2015
- LS Nitride2 Data 2016
- LS Nitride2 Data 2017
- LS Nitride2 Data 2018
- LS Nitride2 Data 2019
- LS Nitride2 Data 2020
Uniformity Data
- LS Nitride2 Thickness Uniformity 2014
- LS Nitride2 Thickness Uniformity 2015
- LS Nitride2 Thickness Uniformity 2016
- LS Nitride2 Thickness Uniformity 2017
- LS Nitride2 Thickness Uniformity 2018
- LS Nitride2 Thickness Uniformity 2019
- LS Nitride2 Thickness Uniformity 2020
Amorphous-Si deposition (PECVD #2)
Cleaning Recipes (PECVD #2)
To Be Added...
ICP-PECVD (Unaxis VLR)
- Particulates in Unaxis films @100C-2019
- Particulates in Unaxis films @250C-2019
- Particulates in Unaxis films @250C-2020
SiN deposition (Unaxis VLR)
These Si3N4 recipes (100C) are not valid currently, and are still under development. -- Demis 2019-11-22
These Si3N4 recipes (2500C) are valid.
- SiN 250C 300nm Data-2020
- SiN LS 250C 300nm Data-2020
- Thickness Uniformity SiN 250C 300nm-2020
- Thickness Uniformity SiN LS 250C 300nm-2020
- SiN 250C Table-2020
- SiN LS 250C Table-2020
SiO2 deposition (Unaxis VLR)
- SiO2 LDR 100C 300nm Data-2019
- SiO2 HDR 100C 300nm Data-2019
- Thickness Uniformity SiO2 LDR 100C 300nm-2019
- SiO2 LDR 100C Table-2019
- SiO2 HDR 100C Table-2019
- Thickness Uniformity SiO2 HDR 100C 300nm-2019
- SiO2 LDR 250C 300nm Data-2019
- SiO2 HDR 250C 300nm Data-2019
- Thickness Uniformity SiO2 LDR 250C 300nm-2019
- Thickness Uniformity SiO2 HDR 250C 300nm-2019
- SiO2 LDR 250C Table-2019
- SiO2 HDR 250C Table-2019
- SiO2 LDR 250C 300nm Data-2020
- SiO2 HDR 250C 300nm Data-2020
- Thickness Uniformity SiO2 LDR 250C 300nm-2020
- Thickness Uniformity SiO2 HDR 250C 300nm-2020
- SiO2 LDR 250C Table-2020
- SiO2 HDR 250C Table-2020
Cleaning Recipes (Unaxis VLR Dep)
You must edit the Post-Dep Clean recipe to correspond to your deposited thickness and material. See the Operating Procedure on the Unaxis Tool Page for details.
- SiNx etches at 20nm/min
- SiO2 etches at 40nm/min