Difference between revisions of "PECVD Recipes"

From UCSB Nanofab Wiki
Jump to navigation Jump to search
(→‎SiO2 deposition (PECVD #1): thickness uniformity)
(→‎SiN deposition (Unaxis VLR): Delete obsolete recipes from page)
Line 2: Line 2:
 
=[[PECVD 1 (PlasmaTherm 790)]]=
  
=[[PECVD 1 (PlasmaTherm 790)]]=
 
Note: Software upgrade performed on 2018-10-10. Note any changes in film.
  
Note: Software upgrade performed on 2018-10-10. Note any changes in film.
  +
 
*[https://docs.google.com/spreadsheets/d/1a0XrY6HuJ6L9niThZYI-u4XH69Hnbe3jkm1qKmrR8Rg/edit#gid=sharing Particulates (Gain4) in PECVD#1 2015]
  
*[https://docs.google.com/spreadsheets/d/1a0XrY6HuJ6L9niThZYI-u4XH69Hnbe3jkm1qKmrR8Rg/edit#gid=sharing Particulates (Gain4) in PECVD#1 2015]
 
*[https://docs.google.com/spreadsheets/d/1ZfkspbCQZmdThC8qB4XyjsyPAzrMF1QbHSMFmH6xSo4/edit#gid=sharing Particulates (Gain4) in PECVD#1 2016]
  
*[https://docs.google.com/spreadsheets/d/1ZfkspbCQZmdThC8qB4XyjsyPAzrMF1QbHSMFmH6xSo4/edit#gid=sharing Particulates (Gain4) in PECVD#1 2016]
Line 9: Line 10:
 
*[https://docs.google.com/spreadsheets/d/1VN551M2oXGWX306HDLQXvZIp3kgxEvWffQqMqnc8ISk/edit#gid=sharing Particulates in PECVD#1 films 2017]
  
*[https://docs.google.com/spreadsheets/d/1VN551M2oXGWX306HDLQXvZIp3kgxEvWffQqMqnc8ISk/edit#gid=sharing Particulates in PECVD#1 films 2017]
 
*[https://docs.google.com/spreadsheets/d/11c0gQHnattIjVO95aBqiL-zL4DInRFihV-YB54xLT40/edit#gid=sharing Particulates in PECVD1 films 2018]
  
*[https://docs.google.com/spreadsheets/d/11c0gQHnattIjVO95aBqiL-zL4DInRFihV-YB54xLT40/edit#gid=sharing Particulates in PECVD1 films 2018]
  +
−
== SiN deposition (PECVD #1) ==
  
  +
==SiN deposition (PECVD #1)==
−
*[[media:New PECVD1-SiO2-standard recipe 2014 SiO2 standard recipe.pdf|SiN Standard Recipe]]
  
  +
  +
*[//www.nanotech.ucsb.edu/wiki/images/3/32/New_PECVD1-SiO2-standard_recipe_2014_SiO2_standard_recipe.pdf SiN Standard Recipe]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEN6LV93LXlnbUhIWU1adVZWMWlXYnc&usp=drive_web#gid=sharing SiN 100nm Data 2014]
  
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEN6LV93LXlnbUhIWU1adVZWMWlXYnc&usp=drive_web#gid=sharing SiN 100nm Data 2014]
 
*[https://docs.google.com/spreadsheets/d/1phx1WficlUEg0xSahaAq4zrRk6m9Eb0ausO8wcAmXqs/edit#gid=sharing SiN 100nm Data 2015]
  
*[https://docs.google.com/spreadsheets/d/1phx1WficlUEg0xSahaAq4zrRk6m9Eb0ausO8wcAmXqs/edit#gid=sharing SiN 100nm Data 2015]
Line 28: Line 31:
 
*[https://docs.google.com/spreadsheets/d/1-OiaH8frAzJzHKfbYTJP808ddzk1Wsv_CixDzG-sSfo/edit#gid=sharing SiN 300nm Thickness uniformity 2019]
  
*[https://docs.google.com/spreadsheets/d/1-OiaH8frAzJzHKfbYTJP808ddzk1Wsv_CixDzG-sSfo/edit#gid=sharing SiN 300nm Thickness uniformity 2019]
   
−
== SiO<sub>2</sub> deposition (PECVD #1) ==
 +
==SiO<sub>2</sub> deposition (PECVD #1)==
  +
−
*[[media:New PECVD1-SiN-standard recipe 2014 SiN standard recipe.pdf|SiO<sub>2</sub> Standard Recipe]]
  
  +
*[//www.nanotech.ucsb.edu/wiki/images/8/87/New_PECVD1-SiN-standard_recipe_2014_SiN_standard_recipe.pdf SiO<sub>2</sub> Standard Recipe]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEw0bjFEdTF2SUhRa25Ca0d0SzBha3c&usp=drive_web#gid=sharing SiO<sub>2</sub> 100nm Data 2014]
  
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEw0bjFEdTF2SUhRa25Ca0d0SzBha3c&usp=drive_web#gid=sharing SiO<sub>2</sub> 100nm Data 2014]
 
*[https://docs.google.com/spreadsheets/d/1JWNUcH8l90xif-0BhYKJee9nXxE4hnvvp6N2NtZLYXY/edit#gid=sharing SiO<sub>2</sub> 100nm Data 2015]
  
*[https://docs.google.com/spreadsheets/d/1JWNUcH8l90xif-0BhYKJee9nXxE4hnvvp6N2NtZLYXY/edit#gid=sharing SiO<sub>2</sub> 100nm Data 2015]
Line 37: Line 41:
 
*[https://docs.google.com/spreadsheets/d/1DdjIRGsfJ7WCrxQoGpmzkjLGJhpBTFNYLFmmHcNjAjk/edit#gid=sharing SiO<sub>2</sub> 300nm Data 2018]
  
*[https://docs.google.com/spreadsheets/d/1DdjIRGsfJ7WCrxQoGpmzkjLGJhpBTFNYLFmmHcNjAjk/edit#gid=sharing SiO<sub>2</sub> 300nm Data 2018]
 
*[https://docs.google.com/spreadsheets/d/1QbhukSuVNueT067IVEpweSlD4B7GQecf-tfQFQeV6Xs/edit#gid=sharing SiO<sub>2</sub> 300nm Data 2019]
  
*[https://docs.google.com/spreadsheets/d/1QbhukSuVNueT067IVEpweSlD4B7GQecf-tfQFQeV6Xs/edit#gid=sharing SiO<sub>2</sub> 300nm Data 2019]
−  
   
   
Line 48: Line 51:
 
*[https://docs.google.com/spreadsheets/d/1FatUAEegWuDRzVa47L1_cqgRs0AZ_Fao9jpwz5sfln0/edit#gid=sharing SiO<sub>2</sub> 300nm Thickness uniformity 2019]
  
*[https://docs.google.com/spreadsheets/d/1FatUAEegWuDRzVa47L1_cqgRs0AZ_Fao9jpwz5sfln0/edit#gid=sharing SiO<sub>2</sub> 300nm Thickness uniformity 2019]
   
−
== OTHER recipes: Low-Stress (LS) SiN and SiO<sub>x</sub>N<sub>y</sub> deposition (PECVD #1) ==
 +
==OTHER recipes: Low-Stress (LS) SiN and SiO<sub>x</sub>N<sub>y</sub> deposition (PECVD #1)==
 
<!-- Placeholders - Not uploaded yet-->
  
<!-- Placeholders - Not uploaded yet-->
  +
−
*[[media:New PECVD1-LS SIN-Turner05recipe 2014 LS SIN recipe.pdf|LS SiN Standard Recipe]]
  
  +
*[//www.nanotech.ucsb.edu/wiki/images/4/4a/New_PECVD1-LS_SIN-Turner05recipe_2014_LS_SIN_recipe.pdf LS SiN Standard Recipe]
 
*[https://docs.google.com/spreadsheets/d/1Joz0az9TGZWQc4CiMQJZzLBbNFbx_hH2Oc0B4NNJmYk/edit#gid=sharing LS SiN Data 2014]
  
*[https://docs.google.com/spreadsheets/d/1Joz0az9TGZWQc4CiMQJZzLBbNFbx_hH2Oc0B4NNJmYk/edit#gid=sharing LS SiN Data 2014]
 
*[https://docs.google.com/spreadsheets/d/1xIzc2CufRYNSfAtsOXpw3IzHreeu42BWrLBV0kzP6kA/edit#gid=sharing LS SiN 1000A Thickness uniformity 2014]
  
*[https://docs.google.com/spreadsheets/d/1xIzc2CufRYNSfAtsOXpw3IzHreeu42BWrLBV0kzP6kA/edit#gid=sharing LS SiN 1000A Thickness uniformity 2014]
−
*[[media:New PECVD1-LS SION-recipe 2014 LS SION recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Standard Recipe]]
 +
*[//www.nanotech.ucsb.edu/wiki/images/2/24/New_PECVD1-LS_SION-recipe_2014_LS_SION_recipe.pdf SiO<sub>x</sub>N<sub>y</sub> Standard Recipe]
 
*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data 2014]
  
*[https://docs.google.com/spreadsheets/d/1rixyzAAq6q08M5OwvZiDVoh3K8B566XKM-UZAQIAnsg/edit#gid=sharing SiO<sub>x</sub>N<sub>y</sub> Data 2014]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub>1000A Thickness uniformity 2014]
  
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEttR2JSTkRoamR0SUZ4bE5QUW9uS2c&usp=sharing SiO<sub>x</sub>N<sub>y</sub>1000A Thickness uniformity 2014]
   
 
=[[PECVD 2 (Advanced Vacuum)]]=
  
=[[PECVD 2 (Advanced Vacuum)]]=
  +
 
*[https://docs.google.com/spreadsheets/d/1kj0SWxRpnPRoGld8k3sW-3yK1iPm3buTkvlJSN5YPV4/edit#gid=sharing Particulates (Gain4) in PECVD#2 2015]
  
*[https://docs.google.com/spreadsheets/d/1kj0SWxRpnPRoGld8k3sW-3yK1iPm3buTkvlJSN5YPV4/edit#gid=sharing Particulates (Gain4) in PECVD#2 2015]
 
*[https://docs.google.com/spreadsheets/d/1xpk9tJrE68NIJ_1yIym0xBxd4fnzHHBHdkhFehruO3E/edit#gid=sharing Particulates (Gain4) in PECVD#2 2016]
  
*[https://docs.google.com/spreadsheets/d/1xpk9tJrE68NIJ_1yIym0xBxd4fnzHHBHdkhFehruO3E/edit#gid=sharing Particulates (Gain4) in PECVD#2 2016]
Line 65: Line 70:
 
*[https://docs.google.com/spreadsheets/d/1aU6fTyQ5MlGD4uCa9gepG5rLJzW3wlkOWSKEl_w_Ye4/edit#gid=sharing Particulates in PECVD#2 films 2018]
  
*[https://docs.google.com/spreadsheets/d/1aU6fTyQ5MlGD4uCa9gepG5rLJzW3wlkOWSKEl_w_Ye4/edit#gid=sharing Particulates in PECVD#2 films 2018]
 
*[https://docs.google.com/spreadsheets/d/1aU6fTyQ5MlGD4uCa9gepG5rLJzW3wlkOWSKEl_w_Ye4/edit#gid=sharing Particulates in PECVD#2 films 2019]
  
*[https://docs.google.com/spreadsheets/d/1aU6fTyQ5MlGD4uCa9gepG5rLJzW3wlkOWSKEl_w_Ye4/edit#gid=sharing Particulates in PECVD#2 films 2019]
  +
−
== SiO<sub>2</sub> deposition (PECVD #2) ==
  
  +
==SiO<sub>2</sub> deposition (PECVD #2)==
   
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]
  
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]
Line 81: Line 87:
   
   
−
*[[media:New Adv PECVD OXIDE 300C standard recipe OXIDE Standard Recipe.pdf|Oxide Standard Recipe 2014-5/9/18]]
 +
*[//www.nanotech.ucsb.edu/wiki/images/8/8d/New_Adv_PECVD_OXIDE_300C_standard_recipe_OXIDE_Standard_Recipe.pdf Oxide Standard Recipe 2014-5/9/18]
−
*[[media:STD SiO2 5-9-18.pdf|STD SiO2 5/9/18]]
 +
*[//www.nanotech.ucsb.edu/wiki/images/b/b0/STD_SiO2_5-9-18.pdf STD SiO2 5/9/18]
   
−
== SiN deposition (PECVD #2) ==
 +
==SiN deposition (PECVD #2)==
   
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]
  
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]
Line 100: Line 106:
   
   
−
*[[media:SiNx Films by PECVD2.pdf|SiNx Film Stress vs LF and HF Duration Time, and Gas Flowing-rate]]
 +
*[//www.nanotech.ucsb.edu/wiki/images/4/4c/SiNx_Films_by_PECVD2.pdf SiNx Film Stress vs LF and HF Duration Time, and Gas Flowing-rate]
   
   
−
*[[media:New Adv PECVD-Nitride2 300C standard recipe Nitride2 Standard Recipe.pdf|Nitride2 Standard Recipe 2014-5/9/2018]]
 +
*[//www.nanotech.ucsb.edu/wiki/images/e/e1/New_Adv_PECVD-Nitride2_300C_standard_recipe_Nitride2_Standard_Recipe.pdf Nitride2 Standard Recipe 2014-5/9/2018]
−
*[[media:STD Nitride 5-9-18 Dep.recipe.pdf|STD Nitride2 Standard Recipe 5/9/2018]]
 +
*[//www.nanotech.ucsb.edu/wiki/images/5/52/STD_Nitride_5-9-18_Dep.recipe.pdf STD Nitride2 Standard Recipe 5/9/2018]
   
−
==Low-Stress SiN deposition (PECVD #2) ==
 +
==Low-Stress SiN deposition (PECVD #2)==
 
Low-Stress SilIcon Nitride (< 100 MPa)
  
Low-Stress SilIcon Nitride (< 100 MPa)
   
Line 124: Line 130:
   
   
  +
*[//www.nanotech.ucsb.edu/wiki/images/a/a5/New_AdvPECVD-LS_Nitride2_300C_standard_recipe_LS_Nitride2_standard_recipe.pdf LS Nitride2 Standard Recipe 2014-5/9/2018]
   
  +
*[//www.nanotech.ucsb.edu/wiki/images/0/01/STD_LSNitride2_5-9-18.pdf STD LSNitride2 5/9/2018]
−
*[[media:New AdvPECVD-LS Nitride2 300C standard recipe LS Nitride2 standard recipe.pdf|LS Nitride2 Standard Recipe 2014-5/9/2018]]
  
−  
−
*[[media:STD LSNitride2 5-9-18.pdf|STD LSNitride2 5/9/2018]]
  
−  
−
*[[media:STD LSNitride2 12-14-18 recipe.pdf|STD LSNitride2 12/14/2018]]
  
−  
−
== Amorphous-Si deposition (PECVD #2) ==
  
−
*[[media:03-Amorphous-Si-PECVD-2.pdf|Amorphous Si Deposition Recipe]]
  
−
*[[media:ASi deposition and film stress using AV dep tool.pdf|Amorphous Si Films and Their Stress]]
  
−  
−
= [[ICP-PECVD (Unaxis VLR)]] =
  
−
==SiN deposition (Unaxis VLR) ==
  
−
=== SiN (2% SiH<sub>4</sub>) ===
  
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |50° (pinholes)
  
−
! width="350" align="center" |100° (pinholes)
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-5W-50C-High-Stress.pdf|SiN Deposition Recipe (5W 50° High Stress)]]
 
−
*[[Media:PECVD2-SiN-Recipe-50W-50C-Medium-Stress.pdf|SiN Deposition Recipe (50W 50° Medium Stress)]]
 
−
*[[Media:PECVD2-SiN-Recipe-120W-50C-Low-Stress.pdf|SiN Deposition Recipe (120W 50° Low Stress)]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-5W-100C-High-Stress.pdf|SiN Deposition Recipe (5W 100° High Stress)]]
 
−
*[[Media:PECVD2-SiN-Recipe-50W-100C-Medium-Stress.pdf|SiN Deposition Recipe (50W 100° Medium Stress)]]
 
−
*[[Media:PECVD2-SiN-Recipe-120W-100C-Low-Stress.pdf|SiN Deposition Recipe (120W 100° Low Stress)]]
  
−
*[[Media:PECVD2-SiNx-l.s.-Comparison table-2% SiH4-100C-120W.pdf|Comparison Table SiNx (120W 100° Low Stress)]]
  
−
*[[Media:PECVD2-SiNx-medium-Comparison table-2% SiH4-100C-120W.pdf|Comparison Table SiNx (50W 100° Medium Stress)]]
  
−
*[[Media:PECVD2-SiNx -h.s.-Comparison table-2% SiH4-100C-120W.pdf|Comparison Table SiNx (5W 100° High Stress)]]
  
−
*[[Media:PECVD2-SiNx-medium stress-SEM-2% SiH4-100C-50W.pdf|SiNx SEM images (50W 100° Medium Stress)]]
  
−
*[[Media:PECVD2-SiNx-high stress-SEM-2% SiH4-100C-5W.pdf|SiNx SEM images (5W 100° High Stress)]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-5W-250C-High-Stress.pdf|SiN Deposition Recipe (5W 250° High Stress)]]
 
−
*[[Media:PECVD2-SiN-Recipe-50W-250C-Medium-Stress.pdf|SiN Deposition Recipe (50W 250° Medium Stress)]]
 
−
*[[Media:PECVD2-SiN-Recipe-120W-250C-Low-Stress.pdf|SiN Deposition Recipe (120W 250° Low Stress)]]
  
−
*[[Media:PECVD2-SiNx-l.s.-Comparison table-2% SiH4-100C-120W.pdf|Comparison Table SiNx (120W 250° Low Stress)]]
  
−
*[[Media:PECVD2-SiNx-medium-Comparison table-2% SiH4-100C-120W.pdf|Comparison Table SiNx (50W 250° Medium Stress)]]
  
−
*[[Media:PECVD2-SiNx -h.s.-Comparison table-2% SiH4-100C-120W.pdf|Comparison Table SiNx (5W 250° High Stress)]]
  
−
*[[Media:28-Very-low-pin-hole-density SiNx film at 300 C.pdf|Very-Low-Pin-Hole-Density SiNx Recipe(25W 300°)]]
  
−
|-
  
−
|}
  
−  
−
=== SiN (2% SiH<sub>4</sub> - No-Ar) ===
  
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |50° (pinholes)
  
−
! width="350" align="center" |100° (pinholes)
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-NoAr-5W-50C-High-Stress.pdf|SiN Deposition Recipe - No Ar (5W 50° High Stress)]]
  
−
*[[Media:41-High-stress SiNx at 50 C using Unaxis ICP deposition tool.pdf|Film Properties of High-stress SiN<sub>x</sub> (No Ar, 5W, 50°)]]
 
−
*[[Media:PECVD2-SiN-Recipe-NoAr-50W-50C-Medium-Stress.pdf|SiN Deposition Recipe - No Ar (50W 50° Medium Stress)]]
  
−
*[[Media:36-Medium-stress SiNx using Unaxis ICP deposition tool-a.pdf|Film Properties of Medium-stress SiN<sub>x</sub> (No Ar, 50W, 50°)]]
 
−
*[[Media:PECVD2-SiN-Recipe-NoAr-120W-50C-Low-Stress.pdf|SiN Deposition Recipe - No Ar (120W 50° Low Stress)]]
  
−
*[[Media:40-Low-stress SiNx at 50 C using Unaxis ICP deposition tool.pdf|Film Properties of Low-stress SiN<sub>x</sub> (No Ar, 120W, 50°)]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-NoAr-5W-100C-High-Stress.pdf|SiN Deposition Recipe - No Ar (5W 100° High Stress)]]
  
−
*[[Media:38-High-stress SiNx at 100 C using Unaxis ICP deposition tool.pdf|Film Properties of high-stress SiN<sub>x</sub> (No Ar, 5W, 100°)]]
 
−
*[[Media:PECVD2-SiN-Recipe-NoAr-50W-100C-Medium-Stress.pdf|SiN Deposition Recipe - No Ar (50W 100° Medium Stress)]]
  
−
*[[Media:39-Medium-stress SiNx at 100C using Unaxis ICP deposition tool.pdf|Film Properties of Medium-stress SiN<sub>x</sub> (No Ar, 50W, 100°)]]
 
−
*[[Media:PECVD2-SiN-Recipe-NoAr-120W-100C-Low-Stress.pdf|SiN Deposition Recipe - No Ar (120W 100° Low Stress)]]
  
−
*[[Media:37-Low-stress SiNx at 100 C using Unaxis ICP deposition tool.pdf|Film Properties of Low-stress SiN<sub>x</sub> (No Ar, 120W, 100°)]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-NoAr-5W-250C-High-Stress.pdf|SiN Deposition Recipe - No Ar (5W 250° High Stress)]]
  
−
*[[Media:34-High-stress SiNx at 250 C using Unaxis ICP deposition tool.pdf|Film Properties of High-stress SiN<sub>x</sub> (No Ar, 5W, 250°)]]
 
−
*[[Media:PECVD2-SiN-Recipe-NoAr-50W-250C-Medium-Stress.pdf|SiN Deposition Recipe - No Ar (50W 250° Medium Stress)]]
  
−
*[[Media:36-Medium-stress SiNx using Unaxis ICP deposition tool-a.pdf|Film Properties of Medium-stress SiN<sub>x</sub> (No Ar, 50W, 250°)]]
 
−
*[[Media:PECVD2-SiN-Recipe-NoAr-120W-250C-Low-Stress.pdf|SiN Deposition Recipe - No Ar (120W 250° Low Stress)]]
  
−
*[[Media:35-Low-stress SiNx at 250 C using Unaxis ICP deposition tool.pdf|Film Properties of Low-stress SiN<sub>x</sub> (No Ar, 120W, 250°)]]
  
−
|-
  
−
|}
  
−  
−
=== SiN (2% SiH<sub>4</sub> - No-Ar - Extra N<sub>2</sub>) ===
  
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |50° (pinholes)
  
−
! width="350" align="center" |100° (pinholes)
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-NoAr-ExtraN2-120W-50C-Low-Stress.pdf|SiN Deposition Recipe - No Ar Extra N<sub>2</sub> (120W 50° Low Stress)]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-NoAr-ExtraN2-120W-100C-Low-Stress.pdf|SiN Deposition Recipe - No Ar Extra N<sub>2</sub> (120W 100° Low Stress)]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-NoAr-ExtraN2-120W-250C-Low-Stress.pdf|SiN Deposition Recipe - No Ar Extra N<sub>2</sub> (120W 250° Low Stress)]]
  
−
|-
  
−
|}
  
−  
−
=== SiN (100% SiH<sub>4</sub> ) ===
  
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |50° (pinholes)
  
−
! width="350" align="center" |100° (pinholes)
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-Low stress SiNx-100%SiH4-120W-50C.pdf|SiN Deposition Recipe (120W 50° Low Stress)]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-Low stres SiNx-100% SiH4-120W-100C.pdf|SiN Deposition Recipe (120W 100° Low Stress)]]
  
−
*[[Media:PECVD2-SiN-Table-Low stres SiNx-100% SiH4-120W-100C.pdf|SiN Comparison Table 120W-100(250)C]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-Low stress SiNx-100% SiH4-120W-250C.pdf|SiN Deposition Recipe (120W 250° Low Stress)]]
  
−
*[[Media:PECVD2-SiN-Table-Low stres SiNx-100% SiH4-120W-100C.pdf|SiN Comparison Table 120W, 100(250)C]]
  
−
|- align="left"
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-Medium stress SiNx-100%SiH4-120W-50C.pdf|SiN Deposition Recipe (50W 50° Medium Stress)]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-Medium stres SiNx-100% SiH4-120W-100C.pdf|SiN Deposition Recipe (50W 100° Medium Stress)]]
  
−
*[[Media:PECVD2-SiN-Table-Low stres SiNx-100% SiH4-120W-100C.pdf|SiN Comparison Table 50W, 100(250)C]]
  
−
*[[Media:27-SiNx_Film_(Bias%3D50W)_Sidewall_Coverage.pdf|SiN SEM sidewall coverage]]
  
−
|
  
−
*[[Media:PECVD2-SiN-Recipe-Medium stress SiNx-100% SiH4-120W-250C.pdf|SiN Deposition Recipe (50W 250° Medium Stress)]]
  
−
*[[Media:PECVD2-SiN-Table-Low stres SiNx-100% SiH4-120W-100C.pdf|SiN ComparisonTable 50W, 100(250)C]]
  
−
|-
  
−
|}
  
   
  +
*[//www.nanotech.ucsb.edu/wiki/images/9/98/STD_LSNitride2_12-14-18_recipe.pdf STD LSNitride2 12/14/2018]
−
==SiO<sub>2</sub> deposition (Unaxis VLR) ==
  
−
=== SiO<sub>2</sub> (2% SiH<sub>4</sub>) ===
  
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |50°
  
−
! width="350" align="center" |100°
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:PECVD2-SiO2Recipe-5W-50C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 50°)]]
 
−
|
  
−
*[[Media:PECVD2-SiO2Recipe-5W-100C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 100°)]]
  
−
*[[Media:SiO2 film Unaxis ICP vs PECVD I.pdf|SiO<sub>2</sub> film Unaxis ICP vs PECVD I]]
  
−
*[[Media:SEM pictures SiO2 100C.pdf|SiO<sub>2</sub> SEM pictures 100C]]
  
−
|
  
−
*[[Media:PECVD2-SiO2Recipe-5W-250C.pdf|SiO<sub>2</sub> Deposition Recipe (5W 250°)]]
  
−
*[[Media:SiO2 film Unaxis ICP vs PECVD I.pdf|SiO<sub>2</sub> film Unaxis ICP vs PECVD I]]
  
−
|-
  
−
|}
  
   
  +
==Amorphous-Si deposition (PECVD #2)==
−
=== SiO<sub>2</sub> (2% SiH<sub>4</sub> - No Ar) ===
  
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |50°
  
−
! width="350" align="center" |100°
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:PECVD2-SiO2-Recipe-NoAr-50C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (50°)]]
 
−
*[[Media:29-UnaxisPM3-SiO2-SiH4-O2-He.pdf|SiO<sub>2</sub> Film Properties-No Ar]]
  
−
|
  
−
*[[Media:PECVD2-SiO2-Recipe-NoAr-100C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (100°)]]
  
−
*[[Media:29-UnaxisPM3-SiO2-SiH4-O2-He.pdf|SiO<sub>2</sub> Film Properties-No Ar]]
 
−
|
  
−
*[[Media:PECVD2-SiO2-Recipe-NoAr-250C.pdf|SiO<sub>2</sub> Deposition Recipe - No Ar (250°)]]
  
−
*[[Media:29-UnaxisPM3-SiO2-SiH4-O2-He.pdf|SiO<sub>2</sub> Film Properties-No Ar]]
 
−
|-
  
−
|}
  
   
  +
*[//www.nanotech.ucsb.edu/wiki/images/9/9d/03-Amorphous-Si-PECVD-2.pdf Amorphous Si Deposition Recipe]
−
=== SiO<sub>2</sub> (100% SiH<sub>4</sub> HDR) ===
  
  +
*[//www.nanotech.ucsb.edu/wiki/images/0/09/ASi_deposition_and_film_stress_using_AV_dep_tool.pdf Amorphous Si Films and Their Stress]
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |50°
  
−
! width="350" align="center" |100°
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:SiO2 100% SiH4 HDR 50C.pdf|SiO<sub>2</sub> Deposition Recipe - HDR (50°)]]
 
−
|
  
−
*[[Media:PECVD2-SiO2-Recipe-100%SiH4-HDR-100C.pdf|SiO<sub>2</sub> Deposition Recipe - HDR (100°)]]
 
−
*[[Media:PECVD2-SiO2-HDR-100% SiH4.pdf|SiO<sub>2</sub> Comparison Table - HDR (100°)]]
 
−
|
  
−
*[[Media:PECVD2-SiO2-Recipe-100%SiH4-HDR-250C.pdf|SiO<sub>2</sub> Deposition Recipe - HDR (250°)]]
  
−
*[[Media:PECVD2-SiO2-HDR-100% SiH4.pdf|SiO<sub>2</sub> Comparison Table - HDR (250°)]]
 
−
|-
  
−
|}
  
   
  +
=[[ICP-PECVD (Unaxis VLR)]]=
−
=== SiO<sub>2</sub> (100% SiH<sub>4</sub> LDR) ===
  
  +
==SiN deposition (Unaxis VLR)==
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |50°
  
−
! width="350" align="center" |100°
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:PECVD2-SiO2-Recipe-100%SiH4-LDR-50C.pdf|SiO<sub>2</sub> Deposition Recipe - LDR (50°)]]
 
−
|
  
−
*[[Media:PECVD2-SiO2-Recipe-100%SiH4-LDR-100C.pdf|SiO<sub>2</sub> Deposition Recipe - LDR (100°)]]
 
−
*[[Media:PECVD2-SiO2-LDR-100% SiH4.pdf|SiO<sub>2</sub> Comparison Table - LDR (100°)]]
 
−
*[[Media:PECVD2-SiO2-SEM-LDR SiO2-100% SiH4-100C-15W.pdf|SiO<sub>2</sub> SEM sidewall coverage]]
 
−
|
  
−
*[[Media:PECVD2-SiO2-Recipe-100%SiH4-LDR-250C.pdf|SiO<sub>2</sub> Deposition Recipe - LDR (250°)]]
 
−
*[[Media:PECVD2-SiO2-LDR-100% SiH4.pdf|SiO<sub>2</sub> Comparison Table - LDR (250°)]]
  
−
|-
  
−
|}
  
   
  +
== SiO2 deposition (Unaxis VLR) ==
−
=== Amorphous Si (100%SiH<sub>4</sub> Ar He) ===
  
  +
<br />
−
{| class="wikitable" style="border: 1px solid #D0E7FF; background-color:#ffffff; text-align:center;" border="1"
  
−
|- bgcolor="#D0E7FF"
  
−
! width="350" align="center" |90°
  
−
! width="350" align="center" |250°
  
−
|- align="left"
  
−
|
  
−
*[[Media:02-ICP-PECVD-a-Si Film-90C.pdf|a-Si Deposition Recipe - 90°]]
 
−
|
  
−
*[[Media:01-ICP-PECVD-a-Si-Deposition Recipe-250C.pdf|a-Si Deposition Recipe - 250°]]
  
−
*[[Media:Amorphous Silicon Film Deposition using 12.5W bias on SiO2-Si.pdf|Thick, Defects-free a-Si Film on SiO<sub>2</sub>/Si with a Lower Bias Power]]
  
−
|-
  
−
|}
  

Revision as of 16:35, 5 September 2019

Back to Vacuum Deposition Recipes.

PECVD 1 (PlasmaTherm 790)

Note: Software upgrade performed on 2018-10-10. Note any changes in film.


SiN deposition (PECVD #1)


SiO2 deposition (PECVD #1)


OTHER recipes: Low-Stress (LS) SiN and SiOxNy deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO2 deposition (PECVD #2)


SiN deposition (PECVD #2)



Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)


Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiO2 deposition (Unaxis VLR)


Retrieved from "https://wiki.nanofab.ucsb.edu/w/index.php?title=PECVD_Recipes&oldid=156649"