Revision as of 15:03, 12 March 2019

PECVD 1 (PlasmaTherm 790)

Note: Software upgrade performed on 2018-10-10. Note any changes in film.

SiN deposition (PECVD #1)

SiO₂ deposition (PECVD #1)

OTHER recipes: Low-Stress (LS) SiN and SiO_xN_y deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO₂ deposition (PECVD #2)

SiN deposition (PECVD #2)

SiNx Film Stress vs LF and HF Duration Time, and Gas Flowing-rate

Low-Stress SiN deposition (PECVD #2)

Low-Stress SilIcon Nitride (< 100 MPa)

LS Nitride2 Standard Recipe 2014-5/9/2018

STD LSNitride2 5/9/2018

STD LSNitride2 12/14/2018

Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH₄)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe (5W 50° High Stress) SiN Deposition Recipe (50W 50° Medium Stress) SiN Deposition Recipe (120W 50° Low Stress)	SiN Deposition Recipe (5W 100° High Stress) SiN Deposition Recipe (50W 100° Medium Stress) SiN Deposition Recipe (120W 100° Low Stress) Comparison Table SiNx (120W 100° Low Stress) Comparison Table SiNx (50W 100° Medium Stress) Comparison Table SiNx (5W 100° High Stress) SiNx SEM images (50W 100° Medium Stress) SiNx SEM images (5W 100° High Stress)	SiN Deposition Recipe (5W 250° High Stress) SiN Deposition Recipe (50W 250° Medium Stress) SiN Deposition Recipe (120W 250° Low Stress) Comparison Table SiNx (120W 250° Low Stress) Comparison Table SiNx (50W 250° Medium Stress) Comparison Table SiNx (5W 250° High Stress) Very-Low-Pin-Hole-Density SiNx Recipe(25W 300°)

SiN (2% SiH₄ - No-Ar)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe - No Ar (5W 50° High Stress) Film Properties of High-stress SiN_x (No Ar, 5W, 50°) SiN Deposition Recipe - No Ar (50W 50° Medium Stress) Film Properties of Medium-stress SiN_x (No Ar, 50W, 50°) SiN Deposition Recipe - No Ar (120W 50° Low Stress) Film Properties of Low-stress SiN_x (No Ar, 120W, 50°)	SiN Deposition Recipe - No Ar (5W 100° High Stress) Film Properties of high-stress SiN_x (No Ar, 5W, 100°) SiN Deposition Recipe - No Ar (50W 100° Medium Stress) Film Properties of Medium-stress SiN_x (No Ar, 50W, 100°) SiN Deposition Recipe - No Ar (120W 100° Low Stress) Film Properties of Low-stress SiN_x (No Ar, 120W, 100°)	SiN Deposition Recipe - No Ar (5W 250° High Stress) Film Properties of High-stress SiN_x (No Ar, 5W, 250°) SiN Deposition Recipe - No Ar (50W 250° Medium Stress) Film Properties of Medium-stress SiN_x (No Ar, 50W, 250°) SiN Deposition Recipe - No Ar (120W 250° Low Stress) Film Properties of Low-stress SiN_x (No Ar, 120W, 250°)

SiN (2% SiH₄ - No-Ar - Extra N₂)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe - No Ar Extra N₂ (120W 50° Low Stress)	SiN Deposition Recipe - No Ar Extra N₂ (120W 100° Low Stress)	SiN Deposition Recipe - No Ar Extra N₂ (120W 250° Low Stress)

SiN (100% SiH₄ )

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe (120W 50° Low Stress)	SiN Deposition Recipe (120W 100° Low Stress) SiN Comparison Table 120W-100(250)C	SiN Deposition Recipe (120W 250° Low Stress) SiN Comparison Table 120W, 100(250)C
SiN Deposition Recipe (50W 50° Medium Stress)	SiN Deposition Recipe (50W 100° Medium Stress) SiN Comparison Table 50W, 100(250)C SiN SEM sidewall coverage	SiN Deposition Recipe (50W 250° Medium Stress) SiN ComparisonTable 50W, 100(250)C

SiO₂ deposition (Unaxis VLR)

SiO₂ (2% SiH₄)

50°	100°	250°
SiO₂ Deposition Recipe (5W 50°)	SiO₂ Deposition Recipe (5W 100°) SiO₂ film Unaxis ICP vs PECVD I SiO₂ SEM pictures 100C	SiO₂ Deposition Recipe (5W 250°) SiO₂ film Unaxis ICP vs PECVD I

SiO₂ (2% SiH₄ - No Ar)

50°	100°	250°
SiO₂ Deposition Recipe - No Ar (50°) SiO₂ Film Properties-No Ar	SiO₂ Deposition Recipe - No Ar (100°) SiO₂ Film Properties-No Ar	SiO₂ Deposition Recipe - No Ar (250°) SiO₂ Film Properties-No Ar

SiO₂ (100% SiH₄ HDR)

50°	100°	250°
SiO₂ Deposition Recipe - HDR (50°)	SiO₂ Deposition Recipe - HDR (100°) SiO₂ Comparison Table - HDR (100°)	SiO₂ Deposition Recipe - HDR (250°) SiO₂ Comparison Table - HDR (250°)

SiO₂ (100% SiH₄ LDR)

50°	100°	250°
SiO₂ Deposition Recipe - LDR (50°)	SiO₂ Deposition Recipe - LDR (100°) SiO₂ Comparison Table - LDR (100°) SiO₂ SEM sidewall coverage	SiO₂ Deposition Recipe - LDR (250°) SiO₂ Comparison Table - LDR (250°)

Amorphous Si (100%SiH₄ Ar He)

90°	250°
a-Si Deposition Recipe - 90°	a-Si Deposition Recipe - 250° Thick, Defects-free a-Si Film on SiO₂/Si with a Lower Bias Power

@@ Line 68: / Line 68: @@
 *[https://docs.google.com/spreadsheets/d/1vcaHwraMGNHuRxgWwGp78EJf4T3Jk182wxoCz_neuck/edit#gid=sharing Oxide Data 2017]
 *[https://docs.google.com/spreadsheets/d/1VI-sUmaqois0NsCvf2kQmPfRRa03MjBzl779hmmLtP4/edit#gid=sharing Oxide Data 2018]
-*[https://docs.google.com/spreadsheets/d/1oWnQ3D6oknKWU2bohvSrN85rlEZgQN3YP_ZJ4i8u7do/edit#gid=1 Oxide Data 2019]
+*[https://docs.google.com/spreadsheets/d/1zvSl2P5T926Ol48yH3FBCZm1zCeycl3S8GWQYtzi8VI/edit#gid=1 Oxide Data 2019]
 *[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness Uniformity 2014]
 *[https://docs.google.com/spreadsheets/d/16pZHcGwesXB1mMPwntOudBIlPvRh6A6DI37DEwyYfPw/edit#gid=sharing Oxide Thickness Uniformity 2015]
@@ Line 87: / Line 87: @@
 *[https://docs.google.com/spreadsheets/d/1f3JBEnr7lf0yIMlzlOYKv_bXlIDyXt8vec_rSVJIoOk/edit#gid=sharing Nitride2 Data 2017]
 *[https://docs.google.com/spreadsheets/d/1OO0ewGSqYSzL3lj8fXkgckTkBGQRliD6sBc02IW7wZY/edit#gid=sharing Nitride2 Data 2018]
-*[https://docs.google.com/spreadsheets/d/1OO0ewGSqYSzL3lj8fXkgckTkBGQRliD6sBc02IW7wZY/edit#gid=sharing Nitride2 Data 2019]
+*[https://docs.google.com/spreadsheets/d/1zvSl2P5T926Ol48yH3FBCZm1zCeycl3S8GWQYtzi8VI/edit#gid=1 Nitride2 Data 2019]
 *[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness Uniformity 2014]
 *[https://docs.google.com/spreadsheets/d/14_dYQu3z31fF_oxsUUX8BmDucgv6B07xB3_zqP0HmvM/edit#gid=sharing Nitride2 Thickness Uniformity 2015]

Difference between revisions of "PECVD Recipes"

Revision as of 15:03, 12 March 2019

Contents

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

SiO₂ deposition (PECVD #1)

OTHER recipes: Low-Stress (LS) SiN and SiO_xN_y deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO₂ deposition (PECVD #2)

SiN deposition (PECVD #2)

Low-Stress SiN deposition (PECVD #2)

Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH₄)

SiN (2% SiH₄ - No-Ar)

SiN (2% SiH₄ - No-Ar - Extra N₂)

SiN (100% SiH₄ )

SiO₂ deposition (Unaxis VLR)

SiO₂ (2% SiH₄)

SiO₂ (2% SiH₄ - No Ar)

SiO₂ (100% SiH₄ HDR)

SiO₂ (100% SiH₄ LDR)

Amorphous Si (100%SiH₄ Ar He)

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Search

Difference between revisions of "PECVD Recipes"

Revision as of 15:03, 12 March 2019

PECVD 1 (PlasmaTherm 790)

SiN deposition (PECVD #1)

SiO2 deposition (PECVD #1)

OTHER recipes: Low-Stress (LS) SiN and SiOxNy deposition (PECVD #1)

PECVD 2 (Advanced Vacuum)

SiO2 deposition (PECVD #2)

SiN deposition (PECVD #2)

Low-Stress SiN deposition (PECVD #2)

Amorphous-Si deposition (PECVD #2)

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH4)

SiN (2% SiH4 - No-Ar)

SiN (2% SiH4 - No-Ar - Extra N2)

SiN (100% SiH4 )

SiO2 deposition (Unaxis VLR)

SiO2 (2% SiH4)

SiO2 (2% SiH4 - No Ar)

SiO2 (100% SiH4 HDR)

SiO2 (100% SiH4 LDR)

Amorphous Si (100%SiH4 Ar He)

Navigation menu

Search

SiO₂ deposition (PECVD #1)

OTHER recipes: Low-Stress (LS) SiN and SiO_xN_y deposition (PECVD #1)

SiO₂ deposition (PECVD #2)

SiN (2% SiH₄)

SiN (2% SiH₄ - No-Ar)

SiN (2% SiH₄ - No-Ar - Extra N₂)

SiN (100% SiH₄ )

SiO₂ deposition (Unaxis VLR)

SiO₂ (2% SiH₄)

SiO₂ (2% SiH₄ - No Ar)

SiO₂ (100% SiH₄ HDR)

SiO₂ (100% SiH₄ LDR)

Amorphous Si (100%SiH₄ Ar He)