PECVD Recipes

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PECVD 1 (PlasmaTherm 790)

• Particulates (Gain4) in PECVD#1 2015
• Particulates (Gain4) in PECVD#1 2016
• Particulates (Gain4) in PECVD#1 2017
• Particulates (Gain4 and Gain2) in PECVD#1 films 2017

SiN deposition (PECVD #1)

• SiN Standard Recipe
• SiN 100nm Data 2014
• SiN 100nm Data 2015
• SiN 100nm Data 2016
• SiN 100nm Data 2017
• SiN 300nm Data 2017
• SiN 100 nm Thickness uniformity 2014
• SiN 100 nm Thickness uniformity 2015
• SiN 100 nm Thickness uniformity 2016
• SiN 100 nm Thickness uniformity 2017
• SiN 300nm Thickness uniformity 2017

SiO₂ deposition (PECVD #1)

• SiO₂ Standard Recipe
• SiO₂ 100nm Data 2014
• SiO₂ 100nm Data 2015
• SiO₂ 100nm Data 2016
• SiO₂ 100nm Data 2017
• SiO₂ 300nm Data 2017
• SiO₂ 100nm Thickness uniformity 2014
• SiO₂ 100 nm Thickness uniformity 2015
• SiO₂ 100 nmThickness uniformity 2016
• SiO₂ 100nm Thickness uniformity 2017
• SiO₂ 300nm Thickness uniformity 2017

OTHER recipes: LS SiN and SiO_xN_y deposition (PECVD #1)

• LS SiN Standard Recipe
• LS SiN Data 2014
• LS SiN 1000A Thickness uniformity 2014
• SiO_xN_y Standard Recipe
• SiO_xN_y Data 2014
• SiO_xN_y1000A Thickness uniformity 2014

PECVD 2 (Advanced Vacuum)

• Particulates (Gain4) in PECVD#2 2015
• Particulates (Gain4) in PECVD#2 2016
• Particulates (Gain4) in PECVD#2 2017
• Particulates (Gain4 and Gain2) in PECVD#2 films 2017

SiO₂ deposition (PECVD #2)

• Oxide Standard Recipe
• Oxide Data 2014
• Oxide Data 2015
• Oxide data 2016
• Oxide Data 2017
• Oxide Thickness Uniformity 2014
• Oxide Thickness Uniformity 2015
• Oxide Thickness Uniformity 2016
• Oxide Thickness Uniformity 2017

SiN deposition (PECVD #2)

• Nitride2 Standard Recipe
• Nitride2 Data 2014
• Nitride2 Data 2015
• Nitride2 Data 2016
• Nitride2 Data 2017
• Nitride2 Thickness Uniformity 2014
• Nitride2 Thickness Uniformity 2015
• Nitride2 Thickness Uniformity 2016
• Nitride2 Thickness Uniformity 2017
• SiNx Film Stress vs LF and HF Duration Time, and Gas Flowing-rate

LS SiN deposition (PECVD #2)

• LS Nitride2 Standard Recipe
• LS Nitride2 Data 2014
• LS Nitride2 Data 2015
• LS Nitride2 Data 2016
• LS Nitride2 Data 2017
• LS Nitride2 Thickness Uniformity 2014
• LS Nitride2 Thickness Uniformity 2015
• LS Nitride2 Thickness Uniformity 2016
• LS Nitride2 Thickness Uniformity 2017

Amorphous-Si deposition (PECVD #2)

• Amorphous Si Deposition Recipe
• Amorphous Si Films and Their Stress

ICP-PECVD (Unaxis VLR)

SiN deposition (Unaxis VLR)

SiN (2% SiH₄)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe (5W 50° High Stress) SiN Deposition Recipe (50W 50° Medium Stress) SiN Deposition Recipe (120W 50° Low Stress)	SiN Deposition Recipe (5W 100° High Stress) SiN Deposition Recipe (50W 100° Medium Stress) SiN Deposition Recipe (120W 100° Low Stress) Comparison Table SiNx (120W 100° Low Stress) Comparison Table SiNx (50W 100° Medium Stress) Comparison Table SiNx (5W 100° High Stress) SiNx SEM images (50W 100° Medium Stress) SiNx SEM images (5W 100° High Stress)	SiN Deposition Recipe (5W 250° High Stress) SiN Deposition Recipe (50W 250° Medium Stress) SiN Deposition Recipe (120W 250° Low Stress) Comparison Table SiNx (120W 250° Low Stress) Comparison Table SiNx (50W 250° Medium Stress) Comparison Table SiNx (5W 250° High Stress) Very-Low-Pin-Hole-Density SiNx Recipe(25W 300°)

SiN (2% SiH₄ - No-Ar)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe - No Ar (5W 50° High Stress) Film Properties of High-stress SiNx (No Ar, 5W, 50°) SiN Deposition Recipe - No Ar (50W 50° Medium Stress) Film Properties of Medium-stress SiNx (No Ar, 50W, 50°) SiN Deposition Recipe - No Ar (120W 50° Low Stress) Film Properties of Low-stress SiNx (No Ar, 120W, 50°)	SiN Deposition Recipe - No Ar (5W 100° High Stress) Film Properties of high-stress SiNx (No Ar, 5W, 100°) SiN Deposition Recipe - No Ar (50W 100° Medium Stress) Film Properties of Medium-stress SiNx (No Ar, 50W, 100°) SiN Deposition Recipe - No Ar (120W 100° Low Stress) Film Properties of Low-stress SiNx (No Ar, 120W, 100°)	SiN Deposition Recipe - No Ar (5W 250° High Stress) Film Properties of High-stress SiNx (No Ar, 5W, 250°) SiN Deposition Recipe - No Ar (50W 250° Medium Stress) Film Properties of Medium-stress SiNx (No Ar, 50W, 250°) SiN Deposition Recipe - No Ar (120W 250° Low Stress) Film Properties of Low-stress SiNx (No Ar, 120W, 250°)

SiN (2% SiH₄ - No-Ar - Extra N₂)

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe - No Ar Extra N2 (120W 50° Low Stress)	SiN Deposition Recipe - No Ar Extra N2 (120W 100° Low Stress)	SiN Deposition Recipe - No Ar Extra N2 (120W 250° Low Stress)

SiN (100% SiH₄ )

50° (pinholes)	100° (pinholes)	250°
SiN Deposition Recipe (120W 50° Low Stress)	SiN Deposition Recipe (120W 100° Low Stress) SiN Comparison Table 120W-100(250)C	SiN Deposition Recipe (120W 250° Low Stress) SiN Comparison Table 120W, 100(250)C
SiN Deposition Recipe (50W 50° Medium Stress)	SiN Deposition Recipe (50W 100° Medium Stress) SiN Comparison Table 50W, 100(250)C SiN SEM sidewall coverage	SiN Deposition Recipe (50W 250° Medium Stress) SiN ComparisonTable 50W, 100(250)C

SiO₂ deposition (Unaxis VLR)

SiO₂ (2% SiH₄)

50°	100°	250°
SiO2 Deposition Recipe (5W 50°)	SiO2 Deposition Recipe (5W 100°) SiO2 film Unaxis ICP vs PECVD I SiO2 SEM pictures 100C	SiO2 Deposition Recipe (5W 250°) SiO2 film Unaxis ICP vs PECVD I

SiO₂ (2% SiH₄ - No Ar)

50°	100°	250°
SiO2 Deposition Recipe - No Ar (50°) SiO2 Film Properties-No Ar	SiO2 Deposition Recipe - No Ar (100°) SiO2 Film Properties-No Ar	SiO2 Deposition Recipe - No Ar (250°) SiO2 Film Properties-No Ar

SiO₂ (100% SiH₄ HDR)

50°	100°	250°
SiO2 Deposition Recipe - HDR (50°)	SiO2 Deposition Recipe - HDR (100°) SiO2 Comparison Table - HDR (100°)	SiO2 Deposition Recipe - HDR (250°) SiO2 Comparison Table - HDR (250°)

SiO₂ (100% SiH₄ LDR)

50°	100°	250°
SiO2 Deposition Recipe - LDR (50°)	SiO2 Deposition Recipe - LDR (100°) SiO2 Comparison Table - LDR (100°) SiO2 SEM sidewall coverage	SiO2 Deposition Recipe - LDR (250°) SiO2 Comparison Table - LDR (250°)

Amorphous Si (100%SiH₄ Ar He)

90°	250°
a-Si Deposition Recipe - 90°	a-Si Deposition Recipe - 250° Thick, Defects-free a-Si Film on SiO2/Si with a Lower Bias Power