Difference between revisions of "PECVD 2 (Advanced Vacuum)"

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(→‎Recipes: mention historical data)
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* Recipes for SiO2, Si3N4 and Low-Stress Si3N4 can be found on the PECVD Recipes Page:
 
* Recipes for SiO2, Si3N4 and Low-Stress Si3N4 can be found on the PECVD Recipes Page:
 
** [[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29|Recipes > Vacuum Deposition Recipes > PECVD Recipes > '''PECVD 2 - Advanced Vacuum''']]
 
** [[PECVD Recipes#PECVD 2 .28Advanced Vacuum.29|Recipes > Vacuum Deposition Recipes > PECVD Recipes > '''PECVD 2 - Advanced Vacuum''']]
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** Historical Data is also shown here.
 
* A list of all available deposited films can be found on the Vacuum Deposition Recipes page:
 
* A list of all available deposited films can be found on the Vacuum Deposition Recipes page:
 
** [[Vacuum Deposition Recipes|Recipes > Vacuum Deposition Recipes]]
 
** [[Vacuum Deposition Recipes|Recipes > Vacuum Deposition Recipes]]

Revision as of 09:03, 16 February 2021

PECVD 2 (Advanced Vacuum)
PECVD2.jpg
Tool Type Vacuum Deposition
Location Bay 2
Supervisor Brian Lingg
Supervisor Phone (805) 893-8145
Supervisor E-Mail lingg_b@ucsb.edu
Description Vision 310 Advanced Vacuum PECVD
Manufacturer Veeco
Vacuum Deposition Recipes
Sign up for this tool


About

This open-load system is dedicated to PECVD of SiO2, SiNx, SiOxNy, and a-Si using Silane (2%SiH4, 98% He), N2O, NH3, and N2 gases. The sample electrode has a 270mm diameter useable area, allowing for multiple 4” wafer depositions in a single run. Standard operating temperature is 300C, but can be user changed for temps ranging anywhere from 250 to 350C. The system is equipped with a dual generator, dual frequency option for growth of low-stress Nitride films.

Recipes

See Also

Documentation