Difference between revisions of "PECVD1 Recipes"
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*Refractive Index~1.461 |
*Refractive Index~1.461 |
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| − | == SiO<sub>x</sub>N<sub>y</sub> deposition (PECVD #1) == |
+ | == LS SiO<sub>x</sub>N<sub>y</sub> deposition (PECVD #1) == |
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*[[media:PECVD1-SiON-Recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Deposition Recipes - Varying N/O Ratio]] |
*[[media:PECVD1-SiON-Recipe.pdf|SiO<sub>x</sub>N<sub>y</sub> Deposition Recipes - Varying N/O Ratio]] |
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Revision as of 16:44, 5 December 2014
PECVD 1 (PlasmaTherm 790)
SiN deposition (PECVD #1)
- SiN Standard Recipe
- SiN Data December 2014
- SiN 1000A Thickness uniformity 2014
- Low Stress Si3N4 - Variable Stress Recipes
- Low Stress Si3N4 - Variable Stress Plot
- Deposition rate~11.23nm/min (users must calibrate this prior to critical deps)
- HF e.r.~89nm/min
- Stress~450MPa
- Refractive Index~1.942
SiO2 deposition (PECVD #1)
- Deposition rate~35.52nm/min (users must calibrate this prior to critical deps)
- HF e.r.~645nm/min
- Stress~-408MPa
- Refractive Index~1.461
LS SiOxNy deposition (PECVD #1)
- SiOxNy Deposition Recipes - Varying N/O Ratio
- SiOxNy Stress/Index vs. O/N Ratio
- SiOxNy Recipe
- SiOxNy Data December 2014
- SiOxNy 3000A Thickness uniformity 2014
- Deposition rate~14.99nm/min (users must calibrate this prior to critical deps)
- HF e.r.~417nm/min
- Stress~133MPa
- Refractive Index~1.714
LS SiN deposition (PECVD #1)
- LS SiN Deposition Recipes - Varying N/O Ratio
- LS SiN Stress/Index vs. O/N Ratio
- LS SiN Recipe
- LS SiN Data December 2014
- LS SiN 3000A Thickness uniformity 2014
- Deposition rate~14.99nm/min (users must calibrate this prior to critical deps)
- HF e.r.~417nm/min
- Stress~133MPa
- Refractive Index~1.714