Difference between revisions of "PECV1 Wafer Coating Process Traveler"
Jump to navigation
Jump to search
(subheading) |
(Blanked the page) Tags: Blanking Visual edit |
||
| Line 1: | Line 1: | ||
| − | === PECVD#1 deposition - 300nm SiN film @250°C === |
||
| − | The wafers are ordered from SVM. These are low particle count 4" Si wafer where particle count is very low <100. |
||
| − | |||
| − | a)Log in to PECVD #1 (Staff account) |
||
| − | |||
| − | b)Edit standard recipes (for seasoning, deposition, and cleaning). You can '''ONLY''' change the time in recipes. |
||
| − | * •Seasoning recipe name: |
||
| − | * •Deposition recipe name: |
||
| − | * •Cleaning recipe name: |
||
| − | c)Load the recipe for seasoning, and run it. The goal of this step is to coat chamber walls and prepare it for deposition. |
||
| − | |||
| − | d)Vent the chamber and load 4"Si wafer (place in in the center of platen). You can place small pieces around, to protect wafer from moving |
||
| − | |||
| − | e)Pump down and load the recipe for deposition. |
||
| − | |||
| − | f) Edit the recipe for deposition, change the time ONLY. |
||
| − | |||
| − | g) Run deposition |
||
| − | |||
| − | h) Wait for deposition to be finished. Unload the wafer |
||
| − | |||
| − | i) Wipe sidewall first with water then with IPA. |
||
| − | |||
| − | j) Load recipe for cleaning. Edit the recipe and enter required time for cleaning. |
||
| − | |||
| − | === PECVD#1 deposition - 300nm SiO2 film @250°C === |
||
| − | The wafers are ordered from SVM. These are low particle count 4" Si wafer where particle count is very low <100. |
||
| − | |||
| − | a)Log in to PECVD #1 (Staff account) |
||
| − | |||
| − | b)Edit standard recipes (for seasoning, deposition, and cleaning). You can '''ONLY''' change the time in recipes. |
||
| − | * •Seasoning recipe name: |
||
| − | * •Deposition recipe name: |
||
| − | * •Cleaning recipe name: |
||
| − | c)Load the recipe for seasoning, and run it. The goal of this step is to coat chamber walls and prepare it for deposition. |
||
| − | |||
| − | d)Vent the chamber and load 4"Si wafer (place in in the center of platen). You can place small pieces around, to protect wafer from moving |
||
| − | |||
| − | e)Pump down and load the recipe for deposition. |
||
| − | |||
| − | f) Edit the recipe for deposition, change the time ONLY. |
||
| − | |||
| − | g) Run deposition |
||
| − | |||
| − | h) Wait for deposition to be finished. Unload the wafer |
||
| − | |||
| − | i) Wipe sidewall first with water then with IPA. |
||
| − | |||
| − | j) Load recipe for cleaning. Edit the recipe and enter required time for cleaning. |
||
| − | |||
| − | k)Run the cleaning recipe. |
||