Oxford ICP Etcher - Process Control Data
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Data - InP Ridge Etch (Oxford ICP Etcher)
Work In Progress
This article is still under construction. It may contain factual errors. Content is subject to change.
|InP Ridge Etch: INSERT ETCH PARAMS (IPC< Pressure, gasses etc.)|
|Date||Sample#||Etch Rate (nm/min)||Etch Selectivity (InP/SiO2)||Comments||SEM Images|
|2022-01-11||Software timing bugs fixed - new etch rate appears slightly higher.|| (wrong)|