Oven 5 (Labline)

From UCSB Nanofab Wiki
Revision as of 16:11, 9 February 2017 by Lingg (talk | contribs) (→‎About)
Jump to navigation Jump to search

About

The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.

Documentation

Oven 5

Oven 5 (Labline)
Oven5.jpg
Tool Type Lithography
Location Bay 5
Supervisor Brian Lingg
Supervisor Phone (805) 893-8145
Supervisor E-Mail lingg_b@ucsb.edu
Description ?
Manufacturer Labline