Difference between revisions of "Oven 5 (Labline)"

From UCSB Nanofab Wiki
Jump to: navigation, search
(Documentation)
(About)
Line 1: Line 1:
 
= About =
 
= About =
 
 
The oven temperature can be controlled from 30C-200C with a ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.
+
The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.
   
 
=Documentation=
 
=Documentation=

Revision as of 16:11, 9 February 2017

About

The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.

Documentation

Oven 5

Oven 5 (Labline)
Oven5.jpg
Tool Type Lithography
Location Bay 5
Supervisor Brian Lingg
Supervisor Phone (805) 893-8145
Supervisor E-Mail lingg_b@ucsb.edu
Description ?
Manufacturer Labline