Difference between revisions of "Oven 5 (Labline)"

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= About =
 
= About =
 
   
 
   
The oven temperature can be controlled from 30C-200C with a ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.
+
The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.
  
 
=Documentation=
 
=Documentation=
*[[ media: Watlow_982_controller.pdf|Operating Instructions Chapter 7]]
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*[[ media: Watlow_982_controller.pdf|Operating Instructions: Chapter 7 is specific to Nanofab users]]
 +
*[[ media: Oven5.pdf|Oven 5 Manual]]
  
 
=Oven 5=
 
=Oven 5=
{{tool|{{PAGENAME}}
+
{{tool2|{{PAGENAME}}
 
|picture=Oven5.jpg
 
|picture=Oven5.jpg
 
|type = Lithography
 
|type = Lithography
|super= Brian Lingg
+
|super= Michael Barreraz
 +
|super2= Aidan Hopkins
 
|location=Bay 5
 
|location=Bay 5
 
|description = ?
 
|description = ?
 
|manufacturer =Labline
 
|manufacturer =Labline
 
}}
 
}}

Latest revision as of 09:21, 30 August 2022

About

The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.

Documentation

Oven 5

Oven 5 (Labline)
Oven5.jpg
Location Bay 5
Tool Type Lithography
Manufacturer Labline
Description ?

Primary Supervisor Michael Barreraz
(805) 893-4147
mikebarreraz@ece.ucsb.edu

Secondary Supervisor

Aidan Hopkins


Recipes N/A