Difference between revisions of "Oven 5 (Labline)"

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(Created page with "=Documentation= *Operating Instructions")
 
 
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= About =
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The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.
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=Documentation=
 
=Documentation=
*[[ media: Watlow_982_controller.pdf|Operating Instructions]]
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*[[ media: Watlow_982_controller.pdf|Operating Instructions: Chapter 7 is specific to Nanofab users]]
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*[[ media: Oven5.pdf|Oven 5 Manual]]
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=Oven 5=
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{{tool2|{{PAGENAME}}
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|picture=Oven5.jpg
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|type = Lithography
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|super= Michael Barreraz
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|super2= Aidan Hopkins
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|location=Bay 5
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|description = ?
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|manufacturer =Labline
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}}

Latest revision as of 10:21, 30 August 2022

About

The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.

Documentation

Oven 5

Oven 5 (Labline)
Oven5.jpg
Location Bay 5
Tool Type Lithography
Manufacturer Labline
Description ?

Primary Supervisor Michael Barreraz
(805) 893-4147
mikebarreraz@ece.ucsb.edu

Secondary Supervisor

Aidan Hopkins


Recipes N/A