Difference between revisions of "Oven 5 (Labline)"

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= About =
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The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.
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=Documentation=
 
=Documentation=
*[[ media: Watlow_982_controller.pdf|Operating Instructions]]
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*[[ media: Watlow_982_controller.pdf|Operating Instructions: Chapter 7 is specific to Nanofab users]]
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*[[ media: Oven5.pdf|Oven 5 Manual]]
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=Oven 5=
 
{{tool|{{PAGENAME}}
 
{{tool|{{PAGENAME}}
 
|picture=Oven5.jpg
 
|picture=Oven5.jpg
 
|type = Lithography
 
|type = Lithography
|super= Tony Bosch
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|super= Brian Lingg
|location=Bay 6
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|location=Bay 5
 
|description = ?
 
|description = ?
|manufacturer = Fisher Scientific
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|manufacturer =Labline
 
}}
 
}}

Revision as of 09:20, 17 March 2017

About

The oven temperature can be controlled from 30C-200C with a user programable ramp rate between 0.1C-1.0C/min. Maximum temperature is 200C. There is a N2 purge to provide a dry intert atmosphere during use.

Documentation

Oven 5

Oven 5 (Labline)
Oven5.jpg
Tool Type Lithography
Location Bay 5
Supervisor Brian Lingg
Supervisor Phone (805) 893-8145
Supervisor E-Mail lingg_b@ucsb.edu
Description ?
Manufacturer Labline