Oven 4 (Thermo-Fisher HeraTherm)

From UCSB Nanofab Wiki
Jump to navigation Jump to search
The printable version is no longer supported and may have rendering errors. Please update your browser bookmarks and please use the default browser print function instead.
Oven 4 (Thermo-Fisher HeraTherm)
Oven4.jpg
Location Bay 6
Tool Type Lithography
Manufacturer Thermo Scientific
Model HeraTherm
Description Programmable Oven

Primary Supervisor Michael Barreraz
(805) 893-4147
mikebarreraz@ece.ucsb.edu

Secondary Supervisor

Aidan Hopkins


Recipes N/A

SignupMonkey: Sign up for this tool


About

This oven is often used for long thermal cures and wafer bonding. It has programmable temperature ramps and hold times, but the ramp rate is only "low/med./high" (not an exact ramp rate). A manual needle valve for nitrogen purge has been installed on the back of the oven.

Specifications

  • Maximum Temperature = 330 C (no active cooling)
  • Gases: N2, manually set with needle valve (not programmable)
  • Multi-step programmable temperature ramps
  • Programmable atmospheric purge (for cooling)

Documentation

Template:Instructions

Instructions