Difference between revisions of "OLD - PECVD2 Recipes"
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m (John d moved page PECVD2 Recipes to OLD - PECVD2 Recipes without leaving a redirect: this page is not linked anywhere, looks like 2014 data only) |
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=[[PECVD 2 (Advanced Vacuum)]]= |
=[[PECVD 2 (Advanced Vacuum)]]= |
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| + | ==Photos== |
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| − | *Deposition Rate: ≈ 8.29 nm/min |
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| − | *Refractive Index: ≈ 1.955 |
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| + | *[[media: Photos Sheet1.pdf|Dirty platen]] |
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| − | *Stress ≈ 498MPa |
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| − | *HF etch rate:~48nm/min |
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== SiO<sub>2</sub> deposition (PECVD #2) == |
== SiO<sub>2</sub> deposition (PECVD #2) == |
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| − | *[[media: |
+ | *[[media:NewAdvPECVD OXIDE 300C standard recipe.pdf|Oxide Standard Recipe]] |
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| − | *[[media:ADV OXIDE data April 2014.pdf|Oxide Data (Deposition Rate, Refractive Index, Stress, HF etch rate )]] |
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014] |
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| − | *Deposition Rate: ≈ 28.0 nm/min |
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| − | *Refractive Index: ≈ 1.472 |
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| − | *Stress ≈ -270MPa |
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==LS SiN deposition (PECVD #2) == |
==LS SiN deposition (PECVD #2) == |
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| − | *[[media:New Advanced PECVD LS NITRIDE2 April 2014.pdf|LS Nitride2 Data (Deposition Rate, Refractive Index, Stress, HF etch rate )]] |
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014] |
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| − | *Deposition Rate: ≈ 8.34 nm/min |
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| − | *Refractive Index: ≈ 1.932 |
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| − | *Stress ≈ -46MPa |
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== Amorphous-Si deposition (PECVD #2) == |
== Amorphous-Si deposition (PECVD #2) == |
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