Difference between revisions of "OLD - PECVD2 Recipes"
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m (John d moved page PECVD2 Recipes to OLD - PECVD2 Recipes without leaving a redirect: this page is not linked anywhere, looks like 2014 data only) |
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==Photos== |
==Photos== |
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+ | *[[media: Photos Sheet1.pdf|Dirty platen]] |
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== SiN deposition (PECVD #2) == |
== SiN deposition (PECVD #2) == |
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014] |
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014] |
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==LS SiN deposition (PECVD #2) == |
==LS SiN deposition (PECVD #2) == |
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*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014] |
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014] |
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− | *Deposition Rate: ≈ 7.87 nm/min (users must calibrate this prior to critical deps) |
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− | *Refractive Index: ≈ 1.938 |
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− | *Stress ≈ 1.76MPa |
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− | *HF etch rate~47nm/min |
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== Amorphous-Si deposition (PECVD #2) == |
== Amorphous-Si deposition (PECVD #2) == |