Difference between revisions of "OLD - PECVD2 Recipes"

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m (John d moved page PECVD2 Recipes to OLD - PECVD2 Recipes without leaving a redirect: this page is not linked anywhere, looks like 2014 data only)
 
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==Photos==
 
==Photos==
   
*[[media: Dirty platen photos.pdf|Dirty platen]]
+
*[[media: Photos Sheet1.pdf|Dirty platen]]
 
== SiN deposition (PECVD #2) ==
 
*[[media:New Advanced PECVD-Nitride2 300C standard recipe.pdf|Nitride2 Standard Recipe]]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data Devcember 2014]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]
 
 
*Deposition Rate: ≈ 7.93 nm/min (users must calibrate this prior to critical deps)
 
*Refractive Index: ≈ 1.961
 
*Stress ≈ 495MPa
 
*HF etch rate:~49nm/min
 
   
 
== SiO<sub>2</sub> deposition (PECVD #2) ==
 
== SiO<sub>2</sub> deposition (PECVD #2) ==
*[[media:Advanced PECVD OXIDE 300C standard recipe OXIDE Standard Recipe.pdf|Oxide Standard Recipe]]
+
*[[media:NewAdvPECVD OXIDE 300C standard recipe.pdf|Oxide Standard Recipe]]
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data December 2014]
+
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dGJZaGtDTVRqa1BRdW5iU1N1Y01jd0E&usp=drive_web#gid=sharing Oxide Data 2014]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDRjSHEtYUZRUTg4azE2U0JGUTg2M1E#gid=sharing Oxide Thickness uniformity 2014]
   
 
== SiN deposition (PECVD #2) ==
*Deposition Rate: ≈ 28.64 nm/min (users must calibrate this prior to critical deps)
 
 
*[[media:NewAdvPECVD-Nitride2 300C standard recipe.pdf|Nitride2 Standard Recipe]]
*Refractive Index: ≈ 1.475
 
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dDE0R3FlenNPa2txNmRldTczMXZNNnc#gid=sharing Nitride2 Data 2014]
*Stress ≈ -260MPa
 
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dERkYm85bGtYQVpjVk5GTGJuMkg2anc&usp=drive_web#gid=sharing Nitride2 Thickness uniformity 2014]
*HF etch rate~623nm/min
 
   
 
==LS SiN deposition (PECVD #2) ==
 
==LS SiN deposition (PECVD #2) ==
 
*[[media:NewAdvPECVD-LS Nitride2 300C standard recipe.pdf|LS Nitride2 Standard Recipe]]
 
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data 2014]
*[[media:AdvPECVD-LS Nitride2 300C standard recipe.pdf|LS Nitride2 Standard Recipe]]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dEZvWVhzS1pHUXZkOGcyQWZ4LTNBWGc&usp=drive_web#gid=sharing LS Nitride2 Data October 2014]
 
 
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014]
 
*[https://docs.google.com/spreadsheet/ccc?key=0AnwBU1s4JQo2dENSak1ZNnVaVTFEQTBzdDJMSDlDTFE&usp=drive_web#gid=1=sharing LS Nitride2 Thickness uniformity 2014]
 
*Deposition Rate: ≈ 7.96 nm/min (users must calibrate this prior to critical deps)
 
*Refractive Index: ≈ 1.937
 
*Stress ≈ 2.77MPa
 
*HF etch rate~47nm/min
 
   
 
== Amorphous-Si deposition (PECVD #2) ==
 
== Amorphous-Si deposition (PECVD #2) ==

Latest revision as of 12:28, 3 March 2022